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The Growth of LiNbO3 Thin Film by LPMOCVD Using β-Diketonate Complexes
Korean Journal of Chemical Engineering, March 1999, 16(2), 229-233(5), 10.1007/BF02706841
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Abstract
We studied the material characteristics of polycrystalline films of lithiumniobate (LiNbO3) and its components (Li2O and Nb2O5) prepared by Low Pressure Metal Organic Chemical Vapor Deposition (LPMOCVD). Precursors are Li(DPM) and Nb(DPM)2Cl3, and the carrier gas is nitrogen or argon with 50% of oxygen at 5 Torr. We proposed a quantitative model far Nb2O5 film growth. Li2O film grows on alumina substrate under argon+oxygen atmosphere, but Li2CO3 grows under nitrogen+oxygen atmosphere. On silicon or silica substrate, both react to form lithium silicates. By feeding both precursors, we found the optimum condition for preparing LiNbO3 film from a film composition map as a function of the reaction temperature vs Li mol % in feed gas.
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