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Received September 6, 2000
Accepted March 9, 2001
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Removal of NO and SO2 by Pulsed Corona Discharge Process
Department of Chemical Engineering, Cheju National University, Ara, Cheju 690-756, Korea 1Department of Chemical Engineering, Kyungil University, Hayang, Kyungbuk 712-701, Korea 2Department of Chemical Engineering, Pohang University of Science & Technology, Pohang, Kyungbuk 790-784, Korea
smokie@cheju.cheju.ac.kr
Korean Journal of Chemical Engineering, May 2001, 18(3), 308-316(9), 10.1007/BF02699170
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Abstract
Overall examination was made on the removal of NO and SO2 by pulsed corona discharge process. The mechanism for the removal of NO was found to largely depend on the gas composition. In the absence of oxygen, most of the NO removed was reduced to N2; on the other hand, oxidation of NO to NO2 was dominant in the presence of oxygen even when the content was low. Water vapor was an important ingredient for the oxidation of NO2 to nitric acid rather than that of NO to NO2. The removal of NO only slightly increased with the concentration of ammonia while the effect of ammonia on the removal of SO2 was very significant. The energy density (power delivered/feed gas flow rate) can be a measure for the degree of removal of NO. Regardless of the applied voltage and the flow rate of the feed gas stream, the amount of NO removed was identical at the same energy density. The production of N2O increased with the pulse repetition rate, and the presence of NH3 and SO2 enhanced it. Byproducts generated from propene used as additive were identified and analyzed. The main byproducts other than carbon oxides were found to be ethane and formaldehyde, but their concentrations were negligibly small.
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Lowke JJ, Morrow R, IEEE Trans. Plasma Sci., 23, 661 (1995)
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Mok YS, Nam IS, Chem. Eng. Technol., 22(6), 527 (1999)
Oda T, Kato T, Takahashi T, Shimizu K, IEEE Trans. Ind. Appl., 34, 268 (1998)
Seinfeld JH, "Air Pollution," McGraw Hill, New York (1975)
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Tas MA, Vanhardeveld R, Vanveldhuizen EM, Plasma Chem. Plasma Process., 17(4), 371 (1997)
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van Veldhuizen EM, Zhou LM, Rutgers WR, Plasma Chem. Plasma Process., 18(1), 91 (1998)