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In relation to this article, we declare that there is no conflict of interest.
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Received February 23, 2001
Accepted March 8, 2002
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
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Fabrication of Highly Ordered Pore Array in Anodic Aluminum Oxide

Department of Chemical Engineering, Electrical and Computer Engineering Division, Pohang University of Science and Technology, San31, Hyoja-Dong, Nam-Ku, Pohang, Kyungbuk 790-784, Korea
ce20047@postech.ac.kr
Korean Journal of Chemical Engineering, May 2002, 19(3), 467-473(7), 10.1007/BF02697158
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Abstract

Highly ordered pore array in anodic aluminum oxide was fabricated by anodizing pure aluminum. The order of a pore array was affected by anodizing voltage, electrolyte temperature, and first anodizing time. A regular pore array with mean diameter of 24 nm and interpore distance of 109 nm could be formed by two-step anodization at 40 V, oxalic acid concentration of 0.3 M and electrolyte temperature of 15 ℃. The measured interpore distance showed linearity with anodizing voltage. The diameter of pores was adjusted by pore widening treatment in a 5 wt%_x000D_ phosphoric acid solution at 30 ℃ after two step anodization. The mechanism of self-arrangement of pores could be explained by the repulsive interaction between the pore walls.

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