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Received June 29, 2001
Accepted September 30, 2002
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CF4 Decomposition by Thermal Plasma Processing
Department of Chemical Engineering, Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Korea
dwpark@inha.ac.kr
Korean Journal of Chemical Engineering, May 2003, 20(3), 476-481(6), 10.1007/BF02705551
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Abstract
Decomposition of CF4 was investigated by thermal plasma method. Thermal plasma processes applied to environmental problems have the features of high temperature, high activity and rapid decomposition rate, so it can perfectly decompose non-decomposed materials like CF4 to a high degree. Before the experiment, thermodynamic equilibrium calculations were performed from 300 K to 5,000 K at atmospheric pressure. Based on the thermodynamic equilibrium calculations, the trends in decomposition and recombination of CF4 were studied. Decomposition was carried out by injecting mixtures of CF4 bubbled by Ar, with some addition gases, such as H2 and O2, at atmospheric pressure. Experiments were performed to determine the effects of additive gas identity, additive gas dilution, input power, etc. on the decomposition of CF4. Plasma input power has a slight effect on CF4 decomposition, and the injection of reacting gas through a torch increased CF4 decomposition. Supply of H2 and O2 as addition gases increased the CF4_x000D_
decomposition to 99% for experimental conditions tested.
Keywords
References
Breitbarth FW, Berg D, Dumke K, Tiller HJ, Plasma Chem. Plasma Process., 17(1), 39 (1997)
Chen DT, David MM, Tiers GVD, Schroepfer JN, "A Carbon Arc Process for Treatment of CF4 Emissions,", 32, 3237 (1998)
Kunihihiko K, Tatsu F, Schizuichi F, Manabu S, Jpn. J. Appl. Phys., 36, 5274 (1996)
Kyoto Protocol, Climate Change Conference, Kyoto, Japan, Dec. 1-10 (1997)
Oh SM, Park DW, Korean J. Chem. Eng., 17(3), 299 (2000)
Rarishankara S, Turnipseed AA, Warren RF, Science, 259, 194 (1993)
Wofford BA, Jackson MW, Hartz C, Bevan JW, Environ. Sci. Technol., 33, 1892 (1999)
Chen DT, David MM, Tiers GVD, Schroepfer JN, "A Carbon Arc Process for Treatment of CF4 Emissions,", 32, 3237 (1998)
Kunihihiko K, Tatsu F, Schizuichi F, Manabu S, Jpn. J. Appl. Phys., 36, 5274 (1996)
Kyoto Protocol, Climate Change Conference, Kyoto, Japan, Dec. 1-10 (1997)
Oh SM, Park DW, Korean J. Chem. Eng., 17(3), 299 (2000)
Rarishankara S, Turnipseed AA, Warren RF, Science, 259, 194 (1993)
Wofford BA, Jackson MW, Hartz C, Bevan JW, Environ. Sci. Technol., 33, 1892 (1999)