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In relation to this article, we declare that there is no conflict of interest.
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Received October 20, 2002
Accepted January 8, 2003
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
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Degradation Kinetics of Recalcitrant Organic Compounds in a Decontamination Process with UV/H2O2 and UV/H2O2/TiO2 Processes

Nuclear Power Laboratory, Korea Electric Power Research Institute (KEPRI), 103-16 Moonji-dong, Yuseong-gu, Daejeon 305-380, Korea
hjlee95@kepri.re.kr
Korean Journal of Chemical Engineering, May 2003, 20(3), 503-508(6), 10.1007/BF02705556
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Abstract

In this study, degradation aspects and kinetics of organics in a decontamination process were considered in the degradation experiments of advanced oxidation processes (AOP), i.e., UV, UV/H2O2 and UV/H2O2/TiO2 systems. In the oxalic acid degradation with different H2O2 concentrations, it was found that oxalic acid was degraded with the first order reaction and the highest degradation rate was observed at 0.1 M of hydrogen peroxide. Degradation rate of oxalic acid was much higher than that of citric acid, irrespective of degradation methods, assuming that degradation aspects are related to chemical structures. Of methods, the TiO2 mediated photocatalysis showed the highest rate constant for oxalic acid and citric acid degradation. It was clearly showed that advanced oxidation processes were effective means to degrade recalcitrant organic compounds existing in a decontamination process.

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