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Language: English

Conflict of Interest: In relation to this article, we declare that there is no conflict of interest.

Publication history: Received March 6, 2001
Accepted January 20, 2003

This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Effect of Deposition Temperature on the Growth of Y1Ba2Cu3O7-x Thin Film by Aerosol Assisted Chemical Vapor Deposition Using Liquid Solution Sources

Bo-Ryoun Kim Shafeeque G. Ansari Young-Soon Kim Gil-Sung Kim Sang-Chul Hwang Hee-Gyoun Lee¹ Hyung-Shik Shin^†

Thin Film Technology Lab., Department of Chemical Engineering, Chonbuk National University, Chonju 561-756, Korea ¹Thin Film Technology Lab., Department of Chemical Engineering, IGC Super-power, Schenectady, NY 12304, USA

hsshin@chonbuk.ac.kr

Korean Journal of Chemical Engineering, July 2003, 20(4), 772-775(4), 10.1007/BF02706922

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Abstract

We have investigated the effect of the deposition temperature on the growth of Y1Ba2Cu3O7-x (YBCO) thin film using liquid solution sources on MgO (100) single crystalline substrate and have characterized the superconducting properties. The YBCO films were prepared by aerosol assisted chemical vapor deposition (AACVD). Single solution source of Y, Ba, and Cu β-diketonates dissolved in tetrahydrofuran (THF) was used as precursor. This precursor was passed through an ultrasonic aerosol generator and transported into a hot-wall CVD reactor using Ar as reactant gas (400 sccm). The substrate was placed normal to the gas stream and the substrate temperature was varied from 760 to 860 ℃. Deposition was carried out in oxygen atmosphere maintaining total pressure of 3.2 Torr inside the chamber. Deposition time was also varied from 10 to 30 min. The grown YBCO thin films were highly oriented to (001) orientation perpendicular to the substrate. The film deposited at 815 ℃ had a sharp transition to superconducting state about 87 K. The activation energy estimated from the Arrhenius plot is ~19.14 kJ/mol at the deposition temperature of 815 ℃.

Keywords

Y-Ba-Cu-O Thin Film AACVD Liquid Source Deposition Temperature

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