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Received January 21, 2003
Accepted April 14, 2003
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Patterning Si by Using Surface Functionalization and Microcontact Printing with a Polymeric Ink
Department of Chemistry, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Korea 1Division of Chemistry and Chemical Engineering, Kyungnam University, Masan, Kyungnam 631-701, Korea
ischoi@kaist.ac.kr
Korean Journal of Chemical Engineering, September 2003, 20(5), 956-959(4), 10.1007/BF02697305
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Abstract
This paper describes a simple procedure for patterning Si substrate using a combination of surface functionalization and microcontact printing (μCP). The Si/SiO2 surfaces were chemically modified to present self-assembled monolayers (SAMs) of siloxanes terminating in reactive carboxylic anhydride groups and then patterned with poly(ethylene imine) (PEI) by μCP. We used the patterned thin films of PEI as etch resists on Si surfaces.
References
Breen TL, Fryer PM, Nunes RW, Rothwell ME, Langmuir, 18(1), 194 (2002)
Finnie KR, Haasch R, Nuzzo RG, Langmuir, 16(17), 6968 (2000)
Geissler M, Schmid H, Bietsch A, Michel B, Delamarche E, Langmuir, 18(6), 2374 (2002)
Huck WTS, Yan L, Stroock A, Haag R, Whitesides GM, Langmuir, 15(20), 6862 (1999)
Lee KB, Kim Y, Choi IS, Bull. Korean Chem. Soc., 24, 161 (2003)
Love JC, Wolfe DB, Chabinyc ML, Paul KE, Whitesides GM, J. Am. Chem. Soc., 124(8), 1576 (2002)
John PM, Craighead HG, Appl. Phys. Lett., 68, 1022 (1996)
Wasserman SR, Tao YT, Whitesides GM, Langmuir, 5, 1074 (1989)
Xia Y, Whitesides GM, Angew. Chem.-Int. Edit., 37, 550 (1998)
Xia Y, Kim E, Mrksich M, Whitesides GM, Chem. Mater., 8, 601 (1996)
Xia Y, Zhao XM, Kim E, Whitesides GM, Chem. Mater., 7, 2332 (1995)
Yan L, Huck WTS, Zhao XM, Whitesides GM, Langmuir, 15(4), 1208 (1999)
Yan L, Marzolin C, Terfort A, Whitesides GM, Langmuir, 13(25), 6704 (1997)
Yan L, Zhao XM, Whitesides GM, J. Am. Chem. Soc., 120(24), 6179 (1998)
Zhao XM, Wilbur JL, Whitesides GM, Langmuir, 12(13), 3257 (1996)
Finnie KR, Haasch R, Nuzzo RG, Langmuir, 16(17), 6968 (2000)
Geissler M, Schmid H, Bietsch A, Michel B, Delamarche E, Langmuir, 18(6), 2374 (2002)
Huck WTS, Yan L, Stroock A, Haag R, Whitesides GM, Langmuir, 15(20), 6862 (1999)
Lee KB, Kim Y, Choi IS, Bull. Korean Chem. Soc., 24, 161 (2003)
Love JC, Wolfe DB, Chabinyc ML, Paul KE, Whitesides GM, J. Am. Chem. Soc., 124(8), 1576 (2002)
John PM, Craighead HG, Appl. Phys. Lett., 68, 1022 (1996)
Wasserman SR, Tao YT, Whitesides GM, Langmuir, 5, 1074 (1989)
Xia Y, Whitesides GM, Angew. Chem.-Int. Edit., 37, 550 (1998)
Xia Y, Kim E, Mrksich M, Whitesides GM, Chem. Mater., 8, 601 (1996)
Xia Y, Zhao XM, Kim E, Whitesides GM, Chem. Mater., 7, 2332 (1995)
Yan L, Huck WTS, Zhao XM, Whitesides GM, Langmuir, 15(4), 1208 (1999)
Yan L, Marzolin C, Terfort A, Whitesides GM, Langmuir, 13(25), 6704 (1997)
Yan L, Zhao XM, Whitesides GM, J. Am. Chem. Soc., 120(24), 6179 (1998)
Zhao XM, Wilbur JL, Whitesides GM, Langmuir, 12(13), 3257 (1996)
