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Received July 12, 2003
Accepted October 22, 2003
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Nucleation of Diamond over Nanotube Coated Si Substrate Using Hot Filament Chemical Vapor Deposition (CVD) System
Thin Film Technology Lab., Chonbuk National University, Chonju 561-756, Korea 1Surface Reaction Lab., School of Chemical Engineering, Chonbuk National University, Chonju 561-756, Korea
hsshin@chonbuk.ac.kr
Korean Journal of Chemical Engineering, January 2004, 21(1), 262-266(5), 10.1007/BF02705408
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Abstract
We studied the use of carbon nanotubes as a seeding layer for the nucleation of diamond on Si (100) substrate by using a hot filament chemical vapor deposition (HFCVD) system. Prior to deposition, substrates were seeded with multi-wall carbon nanotube (MWCNT) powder which was prepared separately. MWCNTs were used as nucleation precursors. The diamond grains grew essentially over the nanotubes with a higher growth density in comparison with the un-seeded substrates. The scanning electron microscopy (SEM) image of surface morphology shows crystallites of cauliflower shaped grains. The micro Raman spectroscopic results show a sharp peak at 1,332 cm-1 corresponding to diamond phase. X-ray photoelectron spectroscopic study show the presence of carbon (C1s) phase.
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References
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Gruen DM, Liu S, Krauss AR, Pan X, J. Appl. Phys., 75(3), 1758 (1994)
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Meilunas RJ, Chang RPH, Liu S, Kappes MM, Appl. Phys. Lett., 59(26), 3461 (1991)
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