ISSN: 0256-1115 (print version) ISSN: 1975-7220 (electronic version)
Copyright © 2024 KICHE. All rights reserved

Articles & Issues

Language
English
Conflict of Interest
In relation to this article, we declare that there is no conflict of interest.
Publication history
Received September 26, 2003
Accepted October 31, 2003
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright © KIChE. All rights reserved.

All issues

Effect of Palladium and Nickel on the Temperature Programmed Reduction of Metal Oxides and Metal Oxide Layers

Department of Chemical Engineering, Dongeui University, Busan 614-714, Korea
kim@deu.ac.kr
Korean Journal of Chemical Engineering, March 2004, 21(2), 385-388(4), 10.1007/BF02705425
downloadDownload PDF

Abstract

A new binary oxide support was suggested as being useful in many commercial reactions. Our study was focused on the reduction effect of metal oxide layer on alumina during reaction. Hence temperature programmed reduction of both bulk metal oxide and metal oxide layer on alumina was studied first and the effect of palladium and nickel on the reduction of the oxide support was also investigated. Vanadium oxide was mainly studied and niobium oxide, tantalum oxide, titanium oxide and zirconium oxide were also compared. Some metal oxides were reduced in_x000D_ a hydrogen stream at elevated temperature. In these cases both the bulk metal oxide and metal oxide layer were reduced. A tiny amount of palladium or nickel affected the reduction by decreasing the reduction temperature. The decrease of the reduction temperature was explained by means of increased adsorption of hydrogen on the transition metal and ability of the metal to spillover of the hydrogen to the oxides.

References

Beutel T, Knozinger H, Siborov AV, Zalkovskii VI, J. Chem. Soc.-Faraday Trans., 88(18), 2775 (1992) 
Choi JH, Kim SK, Ha SJ, Park YO, Korean J. Chem. Eng., 18(4), 456 (2001)
Choi JH, Kim SK, Bak YC, Korean J. Chem. Eng., 18(5), 719 (2001)
Glinski M, Kijenski J, React. Kinet. Catal. Lett., 46(2), 379 (1992) 
Kuenski J, Baiker A, Glinski M, Dollenmeier P, Wokaun A, J. Catal., 101, 1 (1986) 
Miller JT, Meyers BL, Modica FS, Lane GS, Vaarkamp M, Koningsberger DC, J. Catal., 143, 395 (1993) 
Reddy BM, Kumar MV, Reddy EP, Mehdi S, Catal. Lett., 36(3-4), 187 (1996) 
Roland V, Salzer R, Summchen L, "Electronic Effect of Hydrogen Spillover on Titania," Spillover and Migration of Surface Species on Catalysts, Elsevier Science (1997)
Santiesteban JG, Calabro DC, Borghard WS, Chang CD, Vartuli JC, Tsao YP, Natal-Santiago MA, Bastian RD, J. Catal., 183(2), 314 (1999) 
Tiernan MJ, Barnes PA, Parkes GMB, J. Phys. Chem. B, 103(2), 338 (1999) 

The Korean Institute of Chemical Engineers. F5, 119, Anam-ro, Seongbuk-gu, 233 Spring Street Seoul 02856, South Korea.
TEL. No. +82-2-458-3078FAX No. +82-507-804-0669E-mail : kiche@kiche.or.kr

Copyright (C) KICHE.all rights reserved.

- Korean Journal of Chemical Engineering 상단으로