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Received January 12, 2004
Accepted March 12, 2004
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Analysis of Langmuir Probe Data in High Density Plasmas
Department of Chemical Engineering, Ajou University, Suwon 443-749, Korea
changkoo@ajou.ac.kr
Korean Journal of Chemical Engineering, May 2004, 21(3), 746-751(6), 10.1007/BF02705515
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Abstract
Analysis of Langmuir probe data by using the parametrization of Laframboise’s numerical results was performed to characterize high density plasmas (argon or deuterium discharges) in terms of plasma parameters such as plasma density and electron temperature. The use of parameterizing Laframboise’s results was found to readily extract the plasma parameters for arbitrary ratios of probe radius to Debye length in high density plasmas. It was observed that the electron temperature increased with decreasing gas pressure, and was nearly constant with power in both argon and deuterium plasmas. The plasma density increased with both power and pressure in both argon and deuterium plasmas. Over the power and pressure ranges used in this work, the plasma density in deuterium plasmas was found to be an order of magnitude lower than that in argon plasmas. A simulation study showed good agreement of predicted electron temperature and plasma density with experimental results for argon plasmas.
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Clements RM, J. Vac. Sci. Technol., 15, 193 (1978)
Cox TI, Deshmukh VGI, Hope DAO, Hydes AJ, Braithwaite N, Benjamin NMP, J. Phys. D: Appl. Phys., 20, 820 (1987)
Economou DJ, Thin Solid Films, 365(2), 348 (2000)
Godyak VA, Piejak RB, Alexandrovich BM, Plasma Sources Sci. Technol., 1, 36 (1992)
Hori T, Bowden MD, Uchino K, Muraoka K, Maeda M, J. Vac. Sci. Technol. A, 14(1), 144 (1996)
Hwang SW, Lee GR, Min JH, Moon SH, Korean J. Chem. Eng., 20(6), 1131 (2003)
Laframboise JG, "Theory of Spherical and Cylindrical Langmuir Probes in a Collisionless, Maxwellian Plasma at Rest," Univ. of Toronto Inst. Aerospace Studies Report No. 100 (1966)
Lieberman MA, Lichtenberg AJ, "Principles of Plasma Discharges and Materials Processing," John Wiley & Sons, Inc., New York (1994)
Lipschultz B, Hutchinson I, LaBomBard B, Wan W, J. Vac. Sci. Technol. A, 4, 1810 (1986)
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Paranjpe AP, McVittie JP, Self SA, J. Appl. Phys., 67, 6718 (1990)
Ryu JH, Cho BO, Hwang SW, Moon SH, Kim CK, Korean J. Chem. Eng., 20(2), 407 (2003)
Schwabedissen A, Benck EC, Roberts JR, Phys. Rev. E, 55, 3450 (1997)
Shatas AA, Hu YZ, Irene EA, J. Vac. Sci. Technol. A, 10, 3119 (1992)
Steinbruchel C, J. Vac. Sci. Technol. A, 8, 1663 (1990)
Wise RS, Lymberopoulos DP, Economou DJ, Appl. Phys. Lett., 68, 2499 (1996)
