ISSN: 0256-1115 (print version) ISSN: 1975-7220 (electronic version)
Copyright © 2025 KICHE. All rights reserved

Articles & Issues

Language
English
Conflict of Interest
In relation to this article, we declare that there is no conflict of interest.
Publication history
Received December 12, 2006
Accepted February 26, 2007
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright © KIChE. All rights reserved.

All issues

Effect of acid concentration and current density on DC etching of aluminum electrolytic capacitor foil

Department of Mechanical Engineering, National Central University, Chung-Li, Taiwan
s9323051@cc.ncu.edu.tw
Korean Journal of Chemical Engineering, September 2007, 24(5), 881-887(7), 10.1007/s11814-007-0059-x
downloadDownload PDF

Abstract

This work studies the effects of acid concentration and current density on etching morphology, microstructure and static capacity of the aluminum foils used in high-voltage electrolytic capacitors. The behavior associated with electrochemical etching was investigated with a potentiostat. The aluminum etching type of DC etching is greatly influenced by the etching potential. The static capacity increased to 0.65 uF/cm2 with 540 V forming voltage by optimization of the etching parameters used in this work.

References

Arai K, Suzuki T, Light Mata., 31, 675 (1981)
Bakish R, Border EZ, Kornhass RJ, J. Electrochem. Soc., 109, 791 (1962)
Bakish R, Electrochem. Technol., 6, 192 (1968)
Zheng ZQ, Zhang WB, China Inst. South Inst. Mining Central Metal., 1, 111 (1983)
Suzuki T, Arai K, Shiga M, Nakamura Y, Metall. Trans., 16A, 27 (1985)
Chen HC, Ou BL, Journal of Materials Science: Materials in Electronics., 15, 819 (2004)
Choi JH, Kim SB, Korean J. Chem. Eng., 11(3), 178 (1994)
Kim SJ, Ko JY, Korean J. Chem. Eng., 23(5), 847 (2006)
Hen Z, Weibin Z, Mater. Sci. Eng. B-Solid State Mater. Adv. Technol., B3, 479 (1989)
Osawa N, Fukuoka K, Corros. Sci., 42, 585 (2000)
Lin W, Tu GC, Lin CF, Peng YM, Corrosion Science, 38, 889 (1996)
Hebert K, Alkire R, J. Electrochem. Soc., 135, 2447 (1988)
Zhou Y, Hebert KR, J. Electrochem. Soc., 145, 2100 (1998)

The Korean Institute of Chemical Engineers. F5, 119, Anam-ro, Seongbuk-gu, 233 Spring Street Seoul 02856, South Korea.
TEL. No. +82-2-458-3078FAX No. +82-507-804-0669E-mail : kiche@kiche.or.kr

Copyright (C) KICHE.all rights reserved.

- Korean Journal of Chemical Engineering 상단으로