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In relation to this article, we declare that there is no conflict of interest.
Publication history
Received August 28, 2006
Accepted June 27, 2007
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
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Photocatalytic activities and specific surface area of TiO2 films prepared by CVD and sol-gel method

Department of Environmental Engineering, Sunchon National University, 315 Maegok, Suncheon, Jeonnam 540-742, Korea
jsc@sunchon.ac.kr
Korean Journal of Chemical Engineering, March 2008, 25(2), 364-367(4), 10.1007/s11814-008-0060-z
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Abstract

The photocatalytic activity of CVD grown films shows significant, non-linear (sigmoid-like) dependency on the film thickness. However, the photocatalytic activity of sol-gel grown film is almost independent of the film thickness. The specific surface area of sol-gel grown films is very small, regardless of the film thickness. Conversely, the specific surface area of CVD grown films indicates significant thickness dependency. The specific area and photocatalytic activity were found to show very similar dependencies on the film thickness.

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