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Received February 28, 2007
Accepted August 10, 2007
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Influence of the silicon surface treatment by plasma etching and scratching on the nucleation of diamond grown in HFCVD - a comparative study
Shafeeque G. Ansari
Mushtaq Ahmad Dar
Young-Soon Kim
Hyung-Kee Seo
Gil-Sung Kim
Rizwan Wahab
Zubaida A. Ansari1
Jae-Myung Seo2
Hyung-Shik Shin†
Thin Film Technology Laboratory, School of Chemical Engineering, Chonbuk National University, Jeonju 561-576, Korea 1Center for Interdisciplinary Research in Basic Sciences, Jamia Millia, Islamia, Jamia Nagar, New Delhi 110025, India 2Functional Nano Thin-film Laboratory, Department of Physics, Chonbuk National University, Jeonju 561-576, Korea
hsshin@chonbuk.ac.kr
Korean Journal of Chemical Engineering, May 2008, 25(3), 593-598(6), 10.1007/s11814-008-0100-8
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Abstract
A comparative study for the nucleation of diamond was carried out using surface treatment like (i) surface scratching with 1 μm diamond paste and (ii) surface etching using chlorine plasma at different RF powers (50, 100 and 150 W). Atomic force microscopic study shows variation in roughness from 31 nm to 110 nm. Scratching results in random scratches, whereas plasma etches a surface uniformly. Scanning electron microscopic observations show well faceted crystallites with a predominance of angular shaped grains corresponding to <100> and <110> crystallite surfaces for the scratched as well as plasma etched substrate. Surface etching at 150W plasma power results in a better growth in comparison with 50 and 100 W plasma powers. Chlorine-radical is found responsible for the changes in the growth morphology. Raman spectroscopy shows a sharp peak at 1,332 cm.1 and a peak at ~1,580 cm.1 for both samples.
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Chiem CV, Seo HK, Ansari SG, Kim GS, Seo JM, Shin HS, Korean J. Chem. Eng., 20(6), 1154 (2003)
Yugo S, Semoto K, Nakamura N, Kimura T, Nakai H, Hashimoto M, Diam. Relat. Mat., 6, 1047 (1997)
Schelz S, Martinu L, Moisan M, Diam. Relat. Mat., 7, 1291 (1998)
Ruder RA, Hudson GC, Posthill JB, Thomas RE, Markunas RJ, Appl. Phys. Lett., 59, 791 (1991)
Baranauskas V, Fukui M, Rodrigues CR, Parizotto N, Trava-Airoldi VJ, Appl. Phys. Lett., 60, 1567 (1992)
Lee JJ, Komarov SF, Hudson JB, Stokes EB, Evelyn MPD, Diam. Relat. Mat., 6, 511 (1997)
Ansari SG, Seo HK, Kim GS, Dar MA, Shahjahan M, Shim HS, Korean J. Chem. Eng., 21(1), 262 (2004)
Crist BV, Handbook of monochromatic XPS spectra, The elements of native Oxides, John Wiley & Sons Ltd, New York, p. 45 (2000)
Moulder JF, Stickle WF, Sobol PE, Bomben KD, Handbook of X-ray photoelectron spectroscopy, Jill Chastain (ed.), Perkin Elmer Corporation, pp. 40-41 (1992)
