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Received October 10, 2007
Accepted November 29, 2007
- This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
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PID controller design for integrating processes with time delay
School of Chemical Engineering and Technology, Yeungnam University, Gyeongsan 712-749, Korea
Korean Journal of Chemical Engineering, July 2008, 25(4), 637-645(9), 10.1007/s11814-008-0106-2
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Abstract
A simple IMC-PID controller design technique is proposed on the basis of the IMC principle for two representative integrating processes with time delay. Further, it is extended to integrating processes with negative and positive zero as well. The proposed PID controller design method is mainly focused on the disturbance rejection, which causes the overshoot in the setpoint response, and a two-degree-of-freedom (2DOF) control structure is used to eliminate this overshoot. The simulation results show the superiority of the proposed tuning rule over other existing methods, when the controller is tuned to have the same robustness level by evaluating the peak of the maximum sensitivity (Ms). The closed loop time constant (λ) has only one user-defined tuning parameter in the proposed method. A guideline is suggested for the selection of λ for different robustness levels by evaluating the value of Ms over a wide range of θ/τ ratios.
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References
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Chen D, Seborg DE, Ind. Eng. Chem. Res., 41(19), 4807 (2002)
Liu T, Cai YZ, Gu DY, Zhang WD, IEE Proc Control Theory Appl., 152, 238 (2005)
Lu X, Yang YS, Wang QG, Zheng WX, J. Process Control, 15, 605 (2005)
Liu T, He X, Gu DY, Zhang WD, IEE Proc Control Theory Appl., 151, 745 (2004)
Gu DY, On LL, Wang P, Zhang WD, Ind. Eng. Chem. Res., 45(9), 3119 (2006)
Wang YG, Cai WJ, Ind. Eng. Chem. Res., 41(12), 2910 (2002)
Luyben WL, Ind. Eng. Chem. Res., 42(13), 3030 (2003)
Shamsuzzoha M, Lee M, Park J, ICIT-2006, IEEE International Conference Bombay, India, 2256-2261, Dec. (2006)
Wang L, Cluett WR, IEEE Proceedings- CTA, 144, 385 (1997)
Chien IL, Fruehauf PS, Chem. Eng. Prog., 86, 33 (1990)
Luyben WL, Ind. Eng. Chem. Res., 35(10), 3480 (1996)
Chidambaram M, Sree RP, Comput. Chem. Eng., 27(2), 211 (2003)
Lee Y, Park S, Lee M, Brosilow C, AIChE J., 44(1), 106 (1998)
Rivera DE, Morari M, Skogestad S, Ind. Eng. Chem. Process Des. Dev., 25, 252 (1986)
Morari M, Zafiriou E, Robust process control, Prentice-Hall, Englewood Cliffs, NJ (1989)
Shamsuzzoha M, Lee M, Ind. Eng. Chem. Res., 46(7), 2077 (2007)
Lee DY, Lee M, Lee Y, Park S, Korean J. Chem. Eng., 20(1), 8 (2003)
Ko BS, Edgar TF, Lee J, Korean J. Chem. Eng., 21(1), 1 (2004)
Chen J, Cheng YC, Yea Y, Korean J. Chem. Eng., 22(2), 173 (2005)