Articles & Issues
- Language
- English
- Conflict of Interest
- In relation to this article, we declare that there is no conflict of interest.
- Publication history
-
Received June 20, 2007
Accepted January 14, 2008
- This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright © KIChE. All rights reserved.
All issues
Diffraction efficiency change in PVA/AA photopolymer films by photosensitive inorganic compound addition
Chemical Engineering Department, Kwangwoon University, 447-1, Wolgye, Nowon, Seoul 139-701, Korea
kdh@kw.ac.kr
Korean Journal of Chemical Engineering, July 2008, 25(4), 874-880(7), 10.1007/s11814-008-0144-9
Download PDF
Abstract
The highest diffraction efficiency (DE) value after illumination and post-curing of photopolymer films were obtained at the SeO2/Acrylamide (AA) Ratios of AA 3.0 g, SeO2 1.0 g and the DE’s were stable values of over 90%. By the addition of SeO2, the maximum DE at the initial stage of illumination was reached at 300 seconds, which suggests SeO2 slows down the photopolymerization of. DE variation curve for the optimum composition during extendedtime illumination of 9,000 seconds resembles a sine curve due to the combination of the monomer diffusion and the photopolymerization, and the photopolymer film expanded at about 8% after photopolymerization due to monomer migration.
Keywords
References
Huawen Y, Mingju H, Zhongyu C, Lisong H, Fuxi G, Proc. of SPIE, 5060, 199 (2003)
Blaya S, Carretero L, Mallavia R, Fimia A, Madrigal RF, Ulibarrena M, Levy D, Appl. Optics, 37, 7604 (1998)
Neipp C, Gallego S, Ortuno M, Marquez A, Belendez A, Pascual I, Opt. Commun., 224, 27 (2003)
Curtis K, Psaltis K, Appl. Optics, 31, 7425 (1992)
Rhee US, Caulfield HJ, Shamir J, Vikram CS, Mirsalehi MM, Opt. Eng., 32, 1839 (1993)
Pu P, Curtis K, Psaltis D, Opt. Eng., 35, 2824 (1996)
Odian G, Principles of polymerization, John Wiley & Sons, New York (1991)
Smothers WK, Monroe RM, Weber AM, Keys DE, SPIE, 1212, 20 (1990)
Calixto S, Appl. Optics, 26, 3904 (1987)
Booth BL, Appl. Optics, 14, 593 (1975)
Zager SA, Weber AM, SPIE, Practical Holography V, 1461 (1991)
Park J, Kim E, Journal of Korean Society for Imaging Science & Technology, 8, 22 (2002)
Garcia C, Pascual I, Costela A, Garcia-Moreno I, Gomez C, Fimia A, Sastre R, Appl. Optics, 41, 2613 (2002)
Blaya S, Acebal P, Carretero L, Fimia A, Opt. Commun., 228, 55 (2003)
Gabriele W, Ip.com Journal, 3, 29 (2003)
Sheridan JT, O’Neill FT, Kelly JV, Trends in Optics and Photonics, 87, 206 (2003)
Kow H, Shi W, Tang L, Ming H, Appl. Optics, 42, 3944 (2003)
Kou HG, Asif A, Shi WF, Eur. Polym. J., 38, 1931 (2002)
Steckman GJ, Shelkovnikov V, Berezhnaya V, Gerasimova T, Solomatine I, Psaltis D, Opt. Lett., 25, 607 (2000)
Blaya S, Carretero L, Madrigal RF, Fimia A, Opt. Commun., 173, 423 (2000)
Jang SJ, Park JH, Son CH, Chung HB, J. KIEEME, 13, 781 (2000)
Chun JY, Yeo CH, Lee HY, Chung HB, J. KIEEME, 10, 89 (1998)
Kim D, Ko J, Yoon D, Kim Y, Southeast Asia Regional Symposium on Chemical Engineering (RSCE2005), 6 (2005)
Kim D, Ko J, Kim Y, Journal of The Society of Information Storage Systems, 21, 112 (2005)
Kim D, Kim Y, Nam S, Lim J, Journal of Industrial and Engineering Chemistry, 12, 762 (2006)
Choi YS, Kim N, Journal of Research Institute for Computer and Information Communication, 6, 105 (1998)
Blaya S, Carretero L, Mallavia R, Fimia A, Madrigal RF, Ulibarrena M, Levy D, Appl. Optics, 37, 7604 (1998)
Neipp C, Gallego S, Ortuno M, Marquez A, Belendez A, Pascual I, Opt. Commun., 224, 27 (2003)
Curtis K, Psaltis K, Appl. Optics, 31, 7425 (1992)
Rhee US, Caulfield HJ, Shamir J, Vikram CS, Mirsalehi MM, Opt. Eng., 32, 1839 (1993)
Pu P, Curtis K, Psaltis D, Opt. Eng., 35, 2824 (1996)
Odian G, Principles of polymerization, John Wiley & Sons, New York (1991)
Smothers WK, Monroe RM, Weber AM, Keys DE, SPIE, 1212, 20 (1990)
Calixto S, Appl. Optics, 26, 3904 (1987)
Booth BL, Appl. Optics, 14, 593 (1975)
Zager SA, Weber AM, SPIE, Practical Holography V, 1461 (1991)
Park J, Kim E, Journal of Korean Society for Imaging Science & Technology, 8, 22 (2002)
Garcia C, Pascual I, Costela A, Garcia-Moreno I, Gomez C, Fimia A, Sastre R, Appl. Optics, 41, 2613 (2002)
Blaya S, Acebal P, Carretero L, Fimia A, Opt. Commun., 228, 55 (2003)
Gabriele W, Ip.com Journal, 3, 29 (2003)
Sheridan JT, O’Neill FT, Kelly JV, Trends in Optics and Photonics, 87, 206 (2003)
Kow H, Shi W, Tang L, Ming H, Appl. Optics, 42, 3944 (2003)
Kou HG, Asif A, Shi WF, Eur. Polym. J., 38, 1931 (2002)
Steckman GJ, Shelkovnikov V, Berezhnaya V, Gerasimova T, Solomatine I, Psaltis D, Opt. Lett., 25, 607 (2000)
Blaya S, Carretero L, Madrigal RF, Fimia A, Opt. Commun., 173, 423 (2000)
Jang SJ, Park JH, Son CH, Chung HB, J. KIEEME, 13, 781 (2000)
Chun JY, Yeo CH, Lee HY, Chung HB, J. KIEEME, 10, 89 (1998)
Kim D, Ko J, Yoon D, Kim Y, Southeast Asia Regional Symposium on Chemical Engineering (RSCE2005), 6 (2005)
Kim D, Ko J, Kim Y, Journal of The Society of Information Storage Systems, 21, 112 (2005)
Kim D, Kim Y, Nam S, Lim J, Journal of Industrial and Engineering Chemistry, 12, 762 (2006)
Choi YS, Kim N, Journal of Research Institute for Computer and Information Communication, 6, 105 (1998)