Articles & Issues
- Language
- English
- Conflict of Interest
- In relation to this article, we declare that there is no conflict of interest.
- Publication history
-
Received March 9, 2009
Accepted May 25, 2009
- This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright © KIChE. All rights reserved.
All issues
Formation of PbTiO3 films from multilayered structures of primitive oxides
Department of Chemical Engineering, Kangwon National University, Chuncheon, Kangwon 200-701, Korea
wglee@kangwon.ac.kr
Korean Journal of Chemical Engineering, January 2010, 27(1), 315-319(5), 10.1007/s11814-009-0293-5
Download PDF
Abstract
The possibility of the formation of PbTiO3 from a multilayer structure of PbO and TiO2 layers on Pt-coated Si substrates prepared by rapid thermal metal organic chemical vapor deposition (RTMOCVD) followed by an appropriate annealing process was examined. The metal organic precursors of PbO and TiO2 were Pb(C2H5)4 and Ti(Oi-C3H7)4, respectively. The composition of the PbTiO3 thin film was adjusted by control of the thickness of each binary oxide layer of PbO and TiO2. The multilayer structure was converted into crystalline PbTiO3 by rapid thermal annealing under O2 ambient at temperature greater than 550 ℃. As the annealing temperature was increased from 550 to 750 ℃, the peaks related to perovskite PbTiO3 in the XRD patterns became stronger and sharper. From this study, it was confirmed that the crystalline PbTiO3 thin films could be prepared from the interdiffusion reaction of multilayer structure composed of primitive binary oxides through the appropriate post annealing process.
References
Bai GR, Chang HLM, Foster CM, Shen Z, Lam DJ, J. Mater. Res., 9, 156 (1994)
Shimizu M, Fujisawa H, Shiosaki T, J. Crystal Growth, 174, 464 (1997)
Lee WG, Woo SI, Intergr. Ferroelectr., 5, 107 (1994)
Khan MA, Comyn TP, Bell AJ, J. Eur. Ceram. Soc., 28, 591 (2008)
Milne SJ, Pyke SH, J.Am. Ceram. Soc., 74, 1407 (1991)
Wu CM, Hong TJ, Wu TB, J. Mater. Res., 12, 2158 (1997)
Huang H, Yao X, Wu XQ, Wang MQ, Zhang LY, Thin Solid Films, 458(1-2), 71 (2004)
Jaffe B, Cook WR, Jaffe H, Pieoelectric ceramics, Academic Press, London (1971)
Murarka SP, Silicides for VLSI applications, Academic Press, New York (1982)
Tochisky EI, Romanova NI, Thin Solid Films, 110, 55 (1983)
Li CC, Desu SB, Ceramic Transaction, 25, 59 (1991)
Li CC, Desu SB, Mat. Res. Soc. Sympo. Proc., 243, 387 (1992)
Song BY, Kwon YJ, Lee WG, Korean Chem. Eng. Res., 45(4), 378 (2007)
Nieminon M, Lehto S, Niinisto L, J. Mater. Chem., 11, 3148 (2001)
Saha S, Agrawal D, Am. Ceram. Bull., 71, 1424 (1992)
Newnham RE, Udaykumar KR, Trolieer-Mckinstry S, Chemical processing of advanced materials, Hench LL, West JK (Eds.), John Wiley, New York (1982)
Hankey DL, Biggers JV, J. Am. Ceram. Soc., 64, C172 (1981)
Kitabatake M, Mitsuyu T, Wasa K, J. Non-Cryst. Solids, 53, 1 (1982)
Kamata T, Kitagawa M, Shibuya M, Hirao T, Jpn. J. Appl. Phys., 3330, 3594 (1991)
Tabata H, Kawai T, Kawai S, Murata O, Fujoka J, Minakata S, Appl. Phys. Lett., 59, 2354 (1991)
Shimizu M, Fujisawa H, Shiosaki T, J. Crystal Growth, 174, 464 (1997)
Lee WG, Woo SI, Intergr. Ferroelectr., 5, 107 (1994)
Khan MA, Comyn TP, Bell AJ, J. Eur. Ceram. Soc., 28, 591 (2008)
Milne SJ, Pyke SH, J.Am. Ceram. Soc., 74, 1407 (1991)
Wu CM, Hong TJ, Wu TB, J. Mater. Res., 12, 2158 (1997)
Huang H, Yao X, Wu XQ, Wang MQ, Zhang LY, Thin Solid Films, 458(1-2), 71 (2004)
Jaffe B, Cook WR, Jaffe H, Pieoelectric ceramics, Academic Press, London (1971)
Murarka SP, Silicides for VLSI applications, Academic Press, New York (1982)
Tochisky EI, Romanova NI, Thin Solid Films, 110, 55 (1983)
Li CC, Desu SB, Ceramic Transaction, 25, 59 (1991)
Li CC, Desu SB, Mat. Res. Soc. Sympo. Proc., 243, 387 (1992)
Song BY, Kwon YJ, Lee WG, Korean Chem. Eng. Res., 45(4), 378 (2007)
Nieminon M, Lehto S, Niinisto L, J. Mater. Chem., 11, 3148 (2001)
Saha S, Agrawal D, Am. Ceram. Bull., 71, 1424 (1992)
Newnham RE, Udaykumar KR, Trolieer-Mckinstry S, Chemical processing of advanced materials, Hench LL, West JK (Eds.), John Wiley, New York (1982)
Hankey DL, Biggers JV, J. Am. Ceram. Soc., 64, C172 (1981)
Kitabatake M, Mitsuyu T, Wasa K, J. Non-Cryst. Solids, 53, 1 (1982)
Kamata T, Kitagawa M, Shibuya M, Hirao T, Jpn. J. Appl. Phys., 3330, 3594 (1991)
Tabata H, Kawai T, Kawai S, Murata O, Fujoka J, Minakata S, Appl. Phys. Lett., 59, 2354 (1991)