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Received June 16, 2010
Accepted December 1, 2010
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Microwave synthesis of mesoporous WO3 doping with bismuth and photocatalytic oxidation of water to H2
Key Laboratory of Radioactive Geology and Exploration Technology Fundamental Science for National Defense, East China Institute of Technology, Fuzhou Jiangxi 344000, China
aabb-ccdd-@tom.com
Korean Journal of Chemical Engineering, May 2011, 28(5), 1299-1303(5), 10.1007/s11814-010-0500-4
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Abstract
Mesostructured tungstic acid was prepared from Na2WO4 with protonated cation-exchange using a surfactant cetyltrimethyl ammonium bromine (CTAB) as the structure-directing agent under microwave radiation. The surfactant was removed by high-temperature calcination, microwave radiation extraction and Soxhlet extraction, respectively. The effects of these methods for removal of the surfactant were investigated in detail. XRD, TEM, FT-IR and UV-Vis were employed to characterize the mesostructured materials. The results showed that the microwave extraction_x000D_
and Soxhlet extraction were favorable to the synthesis of mesostructured tungstic oxide. Mesoporous structure was destroyed as the calcining temperature rising to 823 K. The mesoporous structure of WO3 prepared by microwave radiation extraction had an average pore diameter of 3.4 nm and specific surface area of 120.46m2·g.1. And also, the mesoporous materials WO3 doping with Bi2O3 displayed much higher photocatalytic activity than commercial Degussa P25 TiO2 under visible light and UV irradiation.
References
Iliev V, Tomova D, Bilyarska L, Prahov L, Petrov L, J. Photochem. Photobiol. A: Chem., 159, 281 (2003)
Warren Cross B, Ivan Parkin P, Shane O Neill A, Films Chem.Mater., 15, 2786 (2003)
Luo J, Hepel M, Electrochim. Acta, 46(19), 2913 (2001)
Kominami H, Kato JI, Murakami SY, Ishii Y, Kohno M, Yabutani KI, Yamamoto T, Kera Y, Inoue M, Inui T, Ohtani B, Catal. Today., 84, 186 (2003)
Gondal, et al, Chem. Phys. Lett., 111, 385 (2004)
Hameed A, Gondal MA, Yamani ZH, Catal. Commun., 715, 5 (2004)
Teoha LG, J. S., Laia WH, Hunga IM, Hona MH, J. Alloys Compounds., 251, 396 (2005)
Sallard S, Brezesinski T, Bernd MS, J. Phys. Chem. C., 7200, 111 (2007)
Cui XZ, Guo LM, Cui FM, He QJ, Shi J, J. Phys. Chem. C., 4134, 113 (2009)
Wei W, Dai Y, Huang BB, American Chem. Soc., 5658, 113 (2009)
Zou LX, Zhong Q, Liu QC, Transactions Mater. Heat Treat., 39, 26 (2005)
Zou LX, Zhong Q, Liu QC, Chem. Ind. Eng. Progress., 1015, 24 (2005)
Jiahe L, Zhaoxiang D, Xin J, Fuli L, Yadong L, Inorganic Chem., 234, 41 (2002)
Antonaia A, Santoro MC, Fameli G, Thin Solid Films., 281, 426 (2003)
Gabrusenoks J, Veispals A, Czarnowski A, Electrochim. Acta., 2229, 46 (2001)
Jan S, Dmitry HGS, Jianguang J, Chem. Mater., 5103, 14 (2002)
Yoshiko T, Junko NK, Tsuyoshi T, Chem. Mater., 1194, 13 (2001)
Yu CJ, Wang XC, Fu XZ, Chem. Mater., 1523, 16 (2004)
Hossam H, Yaron P, J. Phys. Chem. B., 2319, 107 (2003)
Rodrigues S, Uma S, Igor N, Martyanov, Klabunde KJ, J. Photochem. Photobiol. A: Chem., 51, 165 (2004)
Warren Cross B, Ivan Parkin P, Shane O Neill A, Films Chem.Mater., 15, 2786 (2003)
Luo J, Hepel M, Electrochim. Acta, 46(19), 2913 (2001)
Kominami H, Kato JI, Murakami SY, Ishii Y, Kohno M, Yabutani KI, Yamamoto T, Kera Y, Inoue M, Inui T, Ohtani B, Catal. Today., 84, 186 (2003)
Gondal, et al, Chem. Phys. Lett., 111, 385 (2004)
Hameed A, Gondal MA, Yamani ZH, Catal. Commun., 715, 5 (2004)
Teoha LG, J. S., Laia WH, Hunga IM, Hona MH, J. Alloys Compounds., 251, 396 (2005)
Sallard S, Brezesinski T, Bernd MS, J. Phys. Chem. C., 7200, 111 (2007)
Cui XZ, Guo LM, Cui FM, He QJ, Shi J, J. Phys. Chem. C., 4134, 113 (2009)
Wei W, Dai Y, Huang BB, American Chem. Soc., 5658, 113 (2009)
Zou LX, Zhong Q, Liu QC, Transactions Mater. Heat Treat., 39, 26 (2005)
Zou LX, Zhong Q, Liu QC, Chem. Ind. Eng. Progress., 1015, 24 (2005)
Jiahe L, Zhaoxiang D, Xin J, Fuli L, Yadong L, Inorganic Chem., 234, 41 (2002)
Antonaia A, Santoro MC, Fameli G, Thin Solid Films., 281, 426 (2003)
Gabrusenoks J, Veispals A, Czarnowski A, Electrochim. Acta., 2229, 46 (2001)
Jan S, Dmitry HGS, Jianguang J, Chem. Mater., 5103, 14 (2002)
Yoshiko T, Junko NK, Tsuyoshi T, Chem. Mater., 1194, 13 (2001)
Yu CJ, Wang XC, Fu XZ, Chem. Mater., 1523, 16 (2004)
Hossam H, Yaron P, J. Phys. Chem. B., 2319, 107 (2003)
Rodrigues S, Uma S, Igor N, Martyanov, Klabunde KJ, J. Photochem. Photobiol. A: Chem., 51, 165 (2004)
