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In relation to this article, we declare that there is no conflict of interest.
Publication history
Received November 8, 2010
Accepted December 16, 2010
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
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Preparation and characterization of the electrodeposited Ni-Co oxide thin films for electrochemical capacitors

Department of Chemical Engineering and Division of Energy Systems Research, Ajou University, Suwon 443-749, Korea 1Department of Chemical and Biomolecular Engineering, Yonsei University, Seoul 120-749, Korea
changkoo@ajou.ac.kr
Korean Journal of Chemical Engineering, June 2011, 28(6), 1464-1467(4), 10.1007/s11814-010-0521-z
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Abstract

Nickel-cobalt (Ni-Co) oxide thin films were electrodeposited onto copper substrates in an electrolyte containing cobalt chloride and nickel chloride, and the electrochemical capacitor behaviors of these films were investigated. The XRD pattern revealed that the electrodeposited Ni-Co oxide thin film was comprised of NiCo2O4. In the SEM image, the electrodeposited Ni-Co oxide film was covered with hexagonal and cubical shaped particles. The electrodeposited Ni-Co oxide electrode exhibited a specific capacitance of 148 F/g at a scan rate of 20 mV, and the current density was fairly stable over 200 cycles. The charge-discharge test confirmed that capacitance of the electrodeposited Ni-Co oxide electrode resulted from the electric double layer capacitance and pseudocapacitance.

References

Lewandowski A, Galinski M, J. Power Sources, 173(2), 822 (2007)
Simon P, Gogotsi Y, Nat. Mater., 7, 845 (2008)
Lee SW, Park DK, Lee JK, Ju JB, Sohn TW, Korean J. Chem. Eng., 18(3), 371 (2001)
Zhang Y, Feng H, Wu X, Wang L, Zhang A, Xia T, Dong H, Li X, Zhang L, Int. J. Hydrog. Energy., 34, 4889 (2009)
Burke A, J. Power Sources, 91(1), 37 (2000)
Zheng JP, Cygan PJ, Jow TR, J. Electrochem. Soc., 142(8), 2699 (1995)
Zheng YZ, Ding HY, Zhang ML, Thin Solid Films., 516, 7381 (2008)
Dubal DP, Dhawale DS, Salunkhe RR, Lokhande CD, J. Alloy. Compd., 496, 370 (2010)
Kandalkar SG, Dhawale DS, Kim CK, Lokhande CD, Synth. Met., 160, 1299 (2010)
Patil UM, Salunkhe RR, Gurav KV, Lokhande CD, Appl. Surf. Sci., 255(5), 2603 (2008)
Lota G, Frackowiak E, Mittal J, Monthioux M, Chem. Phys. Lett., 434(1-3), 73 (2007)
Kuan-Xin H, Quan-Fu W, Xiao-Gang Z, Xin-Lei W, J. Electrochem. Soc., 153(8), A1568 (2006)
Gupta V, Gupta S, Miura N, J. Power Sources, 195(11), 3757 (2010)
Lapham DP, Tseung ACC, J. Mater. Sci., 39(1), 251 (2004)
Gupta V, Gupta S, Miura N, J. Power Sources, 175(1), 680 (2008)
Chi B, Li J, Han Y, Chen Y, Int. J. Hydrog. Energy., 29, 605 (2004)
Deng JJ, Deng JC, Liu ZL, Deng HR, Liu B, J. Mater. Sci., 44(11), 2828 (2009)
Hu ZA, Xie YL, Wang YM, Wu HY, Yang YY, Zhang ZY, Electrochim. Acta, 54(10), 2737 (2009)
Luo JM, Gao B, Zhang XG, Mater. Res. Bull., 43, 1119 (2008)
Dubal DP, Dhawale DS, Salunkhe RR, Lokhande CD, J. Electroanal. Chem., 647, 60 (2010)

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