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- In relation to this article, we declare that there is no conflict of interest.
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Received April 1, 2011
Accepted June 3, 2011
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This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits
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Preparation of nanostructured TiO2 thin films by aerosol flame deposition process
Department of Chemical Engineering, Kangwon National Univerisy, Chuncheon, Kangwon 200-701, Korea
Korean Journal of Chemical Engineering, January 2012, 29(1), 54-58(5), 10.1007/s11814-011-0146-x
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Abstract
Titania thin films were prepared by using aerosol flame deposition process via the pyrolysis of titanium tetra-isopropoxide (TTIP) precursor. We analyzed the specific surface area, primary and secondary particle sizes, crystal structure, thin film morphology and thickness by BET method, electrophoretic light scattering, X-ray diffraction and scanning electron microscopy, respectively. The specific surface area of TiO2 particles deposited is over three-times larger than that of commercial Degussa P25. Crystallite structure of TiO2 particles can be controlled by changing the ratio of CH4/O2 flow rates. We could prepare TiO2 thin films with single anatase phase by keeping the ratio of CH4/O2 flow rates at 200 ml/min: 1,000ml/min. As N2 carrier gas flow rate to bubbler increases, the primary and secondary particle sizes increase, but decrease with increasing total N2 gas flow rate through the central tube. The shorter the deposition height is, the smaller the deposition area is, but the thin film becomes thicker in the central region.
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References
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Nakabayashi S, Fujishima A, Honda K, Chem. Phys. Lett., 102(5), 464 (1983)
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An W, Thimsen E, Biswas P, J. Phys. Chem. Lett., 1(1), 249 (2010)
