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Received October 1, 2013
Accepted May 22, 2014
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This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits
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Electrical and optical characteristics of Ar plasma generated by low-frequency (60Hz) power source
School of Chemical Engineering, Yeungnam University, Gyeonsan 712-749, Korea
Korean Journal of Chemical Engineering, October 2014, 31(10), 1892-1897(6), 10.1007/s11814-014-0145-9
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Abstract
The optical and electrical properties of Ar plasma, ignited using low-frequency (LF, 60 Hz) power source, were investigated. The plasma resistance, electron temperature, and density were found to be ~10^(2) Ω, ~3 eV and ~10^(8) cm-3, respectively. The plasma parameters are strongly dependent on Ar pressure and discharge current, and the results of optical emission analysis showed similar tendency to the probe measurements. The properties of Ar plasma are similar_x000D_
to DC-pulsed discharge, and the polarity of AC power can be possible of depositions and modifications on both conductive and insulating materials, unlike DC discharge. The a-C films, which are deposited using Ar-diluted CH4 plasma, showed a smooth surface, high transmittance (>80%), high sp3 concentration (~40%) and wide optical band-gap (3.55 eV). Consequently, the LF power source was found to be a very simple, convenient and inexpensive tool to generate_x000D_
plasmas for various applications.
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