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Conflict of Interest: In relation to this article, we declare that there is no conflict of interest.

Publication history: Received August 16, 2013
Accepted December 13, 2013

This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Plasma-polymerized n-hexane and its utilization as multilayer moisture-barrier film with aluminum oxide

Kyu-Hyun Hwang Seung-Woo Seo Eun Jung Heeyeop Chae Sung Min Cho^†

School of Chemical Engineering, Sungkyunkwan University, Suwon 440-746, Korea

sungmcho@skku.edu

Korean Journal of Chemical Engineering, March 2014, 31(3), 528-531(4), 10.1007/s11814-013-0278-2

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Abstract

Organic-inorganic multilayer structures were prepared for a moisture barrier. As the organic polymer and inorganic layers, plasma-polymerized n-hexane and aluminum-oxide layers were utilized, respectively. The plasma polymerization of n-hexane was confirmed by the appearance of carbon double bonds in the produced polymer layer. The organic and inorganic layers were prepared sequentially in vacuum, and the repeated growth sequence produced the multilayer structures. The organic-inorganic multilayer structures show about 35% better moisture-barrier property than those obtained from individual organic and inorganic layers.

Keywords

Moisture Barrier Plasma Polymer Hexane Multilayer Atomic Layer Deposition

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