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Received March 27, 2014
Accepted July 14, 2014
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This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits
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Comparison of different applied voltage waveforms on CO2 reforming of CH4 in an atmospheric plasma system
Department of Chemical Engineering, Kangwon National University, Chuncheon-si, Kangwon-do 200-701, Korea
wglee@kangwon.ac.kr
Korean Journal of Chemical Engineering, January 2015, 32(1), 62-67(6), 10.1007/s11814-014-0203-3
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Abstract
Sinusoidal and pulse waveforms of applied voltage were employed for CO2 reforming of CH4 to syngas in an atmospheric dielectric barrier discharge reactor. The discharge power of a pulse waveform was higher than that of sinusoidal waveform at the same applied voltage. The plasma reaction by a pulse waveform enhanced the conversion of CO2 and CH4 and the selectivity of H2 and CO. It was confirmed that CO2 reforming of CH4 can be improved by the a daption of pulse-type power supply in a dielectric barrier discharge reactor immersed in an electrically insulating oil bath.
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Sarmiento B, Brey JJ, Viera IG, Gonzalez-Elipe AR, Cotrino J, Rico VJ, J. Power Sources, 169(1), 140 (2007)
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Goujard V, Tatibouet JM, Batiot-Dupeyrat C, IEEE Trans. Plasma Sci., 37, 2342 (2009)
Benard N, Moreau E, Appl. Phys. Lett., 100, 193503 (2012)
Song HK, Lee H, Choi JW, Na BK, Plasma Chem. Plasma Process., 24(1), 57 (2004)
Lee H, Lee CH, Choi JW, Song HK, Energy Fuels, 21(1), 23 (2007)
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Zhou LM, Xue B, Kogelschatz U, Eliasson B, Energy Fuels, 12(6), 1191 (1998)
Hammer T, Kappes T, Baldauf M, Catal. Today, 89(1-2), 5 (2004)
Nozaki T, Miyazaki Y, Unno Y, Okazaki K, J. Phys. D: Appl. Phys., 34, 3383 (2001)
Li DH, Li X, Bai MG, Tao XM, Shang SY, Dai XY, Yin YX, Int. J. Hydrog. Energy, 34(1), 308 (2009)
Tao XM, Qi FW, Yin YP, Dai XY, Int. J. Hydrog. Energy, 33(4), 1262 (2008)
Zhang YP, Li Y, Wang Y, Liu CJ, Eliasson B, Fuel Process. Technol., 83(1-3), 101 (2003)
Tu X, Whitehead JC, Appl. Catal. B: Environ., 125, 439 (2012)
Snoeckx R, Aerts R, Tu X, Bogaerts A, J. Phys. Chem. C, 117, 4957 (2013)
Gallon HJ, Tu X, Whitehead JC, Plasma Process. Polym., 9, 90 (2012)
