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- In relation to this article, we declare that there is no conflict of interest.
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Received December 9, 2014
Accepted May 2, 2015
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This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits
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Feasibility study of solvent recycle process in spin-on hard mask material manufacturing system
Department of Chemical and Biological Engineering, Korea University, 5-Ga Anam-dong, Seongbuk-gu, Seoul 136-713, Korea
Korean Journal of Chemical Engineering, December 2015, 32(12), 2375-2383(9), 10.1007/s11814-015-0093-z
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Abstract
The spin-on hard mask material for photo resist in semiconductor industry is usually obtained from a small-scale batch process. To obtain high purity products requires multiple-step purification processes, during which a large amount of organic solvent waste is emitted. In this study, a process for regenerating high purity solvent was proposed and the economic efficiency of the proposed process was analyzed. Also, a sensitivity analysis was performed to analyze the changing economics regarding the main variables. From the analysis, the break-even point can be achieved within one year for different cases considered. On the basis of 4-year operation, the profit margins for each case were determined and compared. It is concluded that the waste solvent regeneration process for spin-on hard mask material production in semiconductor industry is feasible and recommended.
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