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- In relation to this article, we declare that there is no conflict of interest.
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Received May 31, 2014
Accepted December 8, 2014
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This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits
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Copyright © KIChE. All rights reserved.
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Effect of chemical mechanical treatment on the optoelectronic properties in CMOS image sensor
Eunmi Choi
Areum Kim
Soon Hyeong Kwon
Yinhua Cui
Seon Jea Lee
Ukjae Lee
Hee Soo Choi
Sang June Hahn1
Sung Pil Yoon2
Hyung Bin Son†
Sung Gyu Pyo†
School of Integrative Engineering, Chung-Ang University, Seoul 156-756, Korea 1Department of Physics, Chung-Ang University, Seoul 156-756, Korea 2Fuel Cell Research Center, Korea Institute of Science and Technology, Seoul 136-791, Korea
being@cau.ac.kr
Korean Journal of Chemical Engineering, February 2015, 32(2), 199-201(3), 10.1007/s11814-014-0367-x
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Abstract
This paper presents the effect focal length variation by controlling chemical mechanical polishing (CMP) processes on the CIS optical performance. White sensitivity was drastically increased, and saturation signal variation and dead zone deviation were reduced. These experimental results showed that controlled focal length was able to increase CIS optoelectronic performance.
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Kawano S, Smith NI, Yamanaka M, Kawata S, Fujita K, Appl. Phys. Express, 042401.1, 4 (2011)
Imai T, Yagi S, Toyoda S, Miyazu J, Naganuma K, Sasaura M, Fujiura K, Appl. Phys. Express, 022501.1, 4 (2011)
Khosla RP, Microelectron. Eng., 19, 615 (1992)
Saeki A, Kozawa T, Tagwa S, Appl. Phys. Express, 075006.1, 2 (2009)
Ryuzaki D, Hoshi Y, Machii Y, Koyama N, Sakurai H, Ashizawa T, Jpn. J. Appl. Phys., 51 (2012)
Seo YJ, Kim SY, Jpn. J. Appl. Phys., 41, 6310 (2002)
Venkatesh RP, Prasad YN, Kwon TY, Kang YJ, Park JG, Jpn. J. Appl. Phys., 071301.1, 51 (2012)
Nakajima A, Noda T, Sasagawa K, Tokuda T, Ishikawa Y, Shiosaka S, Ohta J, Jpn. J. Appl. Phys., 50 (2011)
Shishido S, Noda T, Sasagawa K, Tokuda T, Ohta J, Jpn. J. Appl. Phys., 04DL01.1, 50 (2011)
Tate T, Sugawa K, Chiba K, Kotani K, Ohmi T, Jpn. J. Appl. Phys., 44, 2093 (2005)
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Ono H, Ozaki T, Tanaka H, Kawamoto Y, Jpn. J. Appl. Phys., 30, 3621 (1991)
