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Received April 18, 2014
Accepted September 11, 2014
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This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits
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Mesoporous silica with monodispersed pores synthesized from the controlled self-assembly of silica nanoparticles
1Dalian National Laboratory for Clean Energy, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, Liaoning, China 2University of Chinese Academy of Sciences, Beijing 100049, China
wangsd@dicp.ac.cn
Korean Journal of Chemical Engineering, May 2015, 32(5), 852-859(8), 10.1007/s11814-014-0270-5
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Abstract
Silica nanoparticles with different sizes (ranging from 10 nm to 104 nm) and size distributions were synthesized by semi-batch and semi-batch/batch methods of the Stober process. Then the amorphous silica with different surface areas (ranging from 30m2/g to 400m2/g) and pores (ranging from 3 nm to 33 nm) were obtained by various aging treatments and drying methods of the synthesized colloidal silica sol. The aging treatment resulted in the monodispersed_x000D_
pore distribution and decreased BET surface area of silica. The high-humidity drying method led to the mesoporous silica with uniform pores and decreased small pores. As the silica was obtained by the arrangement of silica nanoparticles, the pore diameter and pore distribution of mesoporous silica were directly related to the size and distribution of nanoparticles. Furthermore, this study offered a new thought for the synthesis of other mesoporous materials with uniform pore distributions.
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Green DL, Lin JS, Lam YF, Hu MZC, Schaefer DW, Harris MT, J. Colloid Interface Sci., 266(2), 346 (2003)
Matsoukas T, Gulari E, J. Colloid Interface Sci., 124, 252 (1988)
Brinker CJ, Scherer GW, Sol-Gel Science: The Physics and Chemistry of Sol-Gel Processing, Academic Press, Boston (1990)
Kurumada KI, Nakabayashi H, Murataki T, Tanigaki M, Colloids Surf., A, 139, 163 (1998)
Sing KSW, Everett DH, Haul RAW, Moscou L, Pierotti RA, Rouquerol J, Siemieniewska T, Pure Appl. Chem., 57, 603 (1985)
Lee S, Cho IS, Lee JH, Kim DH, Kim DW, Kim JY, Shin H, Lee JK, Jung HS, Park NG, Kim K, Ko MJ, Hong KS, Chem. Mater., 22, 1958 (2010)
Wang JZ, Sugawara-Narutaki A, Fukao M, Yokoi T, Shimojima A, Okubo T, ACS Appl. Mater. Interfaces, 3, 1538 (2011)
Wang C, Zhang YH, Dong L, Fu LM, Bai YB, Li TJ, Xu JG, Wei Y, Chem. Mater., 12, 3662 (2000)
Micheletto R, Fukuda H, Ohtsu M, Langmuir, 11(9), 3333 (1995)
Huang Y, Pemberton JE, Colloids Surf., A, 360, 175 (2010)
