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Received September 4, 2015
Accepted November 6, 2015
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This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits
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Process conditions for complete decomposition of CHF3 in a dielectric barrier discharge reactor
Department of Chemical Engineering, Kangwon National University, Chuncheon, Kangwon 24341, Korea
wglee@kangwon.ac.kr
Korean Journal of Chemical Engineering, March 2016, 33(3), 844-850(7), 10.1007/s11814-015-0236-2
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Abstract
Plasma decomposition of CHF3 was investigated using a dielectric barrier discharge immersed in an electrically insulating oil bath in a mixture of CHF3, O2, and N2. CHF3 was well decomposed under a relatively high applied voltage in an atmospheric pressure plasma system. The main by-product was CO2 and its selectivity increased with a decrease in the CHF3 concentration in the feed. Complete decomposition of CHF3 was achieved at a typical process range: an applied voltage ≥7.0 kVp, an initial CHF3 flow rate of 3ml/min, and a total flow rate of 500ml/min. The value of energy efficiency and energy density at the center range for the complete decomposition of CHF3 was 0.01 mmol/kJ and 6.00kWh/Nm3, respectively.
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