ISSN: 0256-1115 (print version) ISSN: 1975-7220 (electronic version)
Copyright © 2024 KICHE. All rights reserved

Articles & Issues

Language
English
Conflict of Interest
In relation to this article, we declare that there is no conflict of interest.
Publication history
Received March 8, 2016
Accepted April 23, 2016
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright © KIChE. All rights reserved.

All issues

Ultra-thin Ni dense membrane prepared by polishing treatment of porous nickel support for high-temperature H2 separation

Advanced Materials and Devices Laboratory, Korea Institute of Energy Research (KIER), 152 Gajeong-ro, Yuseong-gu, Daejeon 34129, Korea
-
Korean Journal of Chemical Engineering, September 2016, 33(9), 2699-2702(4), 10.1007/s11814-016-0116-4
downloadDownload PDF

Abstract

Ultra-thin nickel dense membranes (~0.5 μm) were developed by polishing treatment of porous nickel supports. The polishing treatment involved the use of 400 grit sand paper, 1000 grit, and 1500 grit, which was able to remove the surface pores due to the ductility of the PNS. The hydrogen permeation test showed that 4.53×10.2 mol m-2 s-1 of hydrogen permeation flux through the membrane could be achieved at a temperature of 973K and a pressure difference of 136 kPa. The nitrogen leakage tests confirmed that there were no pinholes on the surface of the ultra-thin nickel dense membrane.

References

Ockwig NW, Nenoff TM, Chem. Rev., 107(10), 4078 (2007)
Phair JW, Badwal SPS, Sci. Technol. Adv. Mater., 7, 792 (2006)
Armor JN, J. Membr. Sci., 147(2), 217 (1998)
Ryi SK, Park JS, Kim SH, Kim DW, Woo BI, Grace JR, Korean J. Chem. Eng., 27(1), 235 (2010)
Tosti S, Int. J. Hydrog. Energy, 35(22), 12650 (2010)
Criscuoli A, Basile A, Drioli E, Loiacono O, J. Membr. Sci., 181(1), 21 (2001)
Dolan MD, J. Membr. Sci., 362(1-2), 12 (2010)
Hao SQ, Sholl DS, J. Membr. Sci., 381(1-2), 192 (2011)
Paglieri SN, Pal NK, Dolan MD, Kim SM, Chien WM, Lamb J, Chandra D, Hubbard KM, Moore DP, J. Membr. Sci., 378(1-2), 42 (2011)
Ernst B, Haag S, Burgard M, J. Membr. Sci., 288(1-2), 208 (2007)
Changrong X, Xiaoxia G, Fanqing L, Dingkun P, Guangyao M, Colloids Surf. A: Physicochem. Eng. Asp., 179, 229 (2001)
Ryi SK, Park JS, Kim SH, Kim DW, Cho KI, J. Membr. Sci., 318(1-2), 346 (2008)
Robertson WM, Z. Metallkd., 64, 436 (1973)

The Korean Institute of Chemical Engineers. F5, 119, Anam-ro, Seongbuk-gu, 233 Spring Street Seoul 02856, South Korea.
TEL. No. +82-2-458-3078FAX No. +82-507-804-0669E-mail : kiche@kiche.or.kr

Copyright (C) KICHE.all rights reserved.

- Korean Journal of Chemical Engineering 상단으로