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Received August 2, 2016
Accepted April 1, 2017
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This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits
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A new process of acidic hydrolysis of residual chlorosilane liquid for the preparation of silica and hydrochloric acid
The Faculty of Environmental Science and Engineering, Kunming University of Science and Technology, Kunming, Yunnan, China 1**Kunming Metallurgical Institute New Materials Co., Ltd., Kunming, Yunnan, China
664031600@qq.com
Korean Journal of Chemical Engineering, June 2017, 34(6), 1793-1800(8), 10.1007/s11814-017-0093-2
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Abstract
We propose a novel process for the preparation of silica and concentrated hydrochloric acid using chlorosilane residual liquid originating from the polysilicon production process. The process was designed and optimized after conducting pilot plant tests. The effects of circulating acid concentration, flow rate, chlorosilane residual liquid treatment load and other factors on silica products were studied. The results showed that the circulating acid flowrate can effectively control the formation of gel, and the amount of chlorosilane residual liquid has significant influence on the hydrolysis efficiency and operation of the hydrolysis tower. The prepared silica was characterized using XRD, XRF, FTIR, SEM, DLS, TG-MS and N2 adsorption/desorption experiments. The results indicated that silica consisted of amorphous particles, which were spherical, had surface hydroxyl, and showed heterogeneous distribution. The average particle size was 50-80 μm and had high specific surface area (565.049m2g-1), large pore volume (0.449 cm3g-1), and a narrow pore size distribution (3.419 nm). The new technology provides a simple, efficient and environmentally friendly way for treating chlorosilane residual liquid, as well as a cost-effective method for the preparation of silica.
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Fidalgo A, Ciriminna R, Ilharco LM. Pagliaro M, Chem. Mater., 17, 6686 (2005)
Pijarn N, Jaroenworaluck A, Sunsaneeyametha W, Stevens R, Powder Technol., 203(3), 462 (2010)
Uchino T, Aboshi A, Kohara S, Ohishi Y, Sakashita M, Aoki K, Phys. Rev. B, 69 (2004)
Lee S, Ha KR, Korean J. Chem. Eng., 33(8), 2469 (2016)
Yan F, Jiang JG, Tian SC, Liu ZW, Shi J, Li KM, Chen XJ, Xu YW, Acs Sustain. Chem. Eng., 4, 4654 (2016)
Cerveny S, Schwartz GA, Otegui J, Colmenero J, Loichen J, Westermann S, J. Phys. Chem. C, 116, 24340 (2012)
Su M, Su H, Du B, Li X, Ren G, Wang S, Korean J. Chem. Eng., 32(5), 852 (2015)
Adam F, Kandasamy K, Balakrishnan S, J. Colloid Interface Sci., 304(1), 137 (2006)
Kim JM, Chang SM, Kong SM, Kim KS, Kim J, Kim WS, Ceram. Int., 35, 1015 (2009)
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Jal PK, Sudarshan M, Saha A, Patel S, Mishra BK, Colloids Surf. A: Physicochem. Eng. Asp., 240, 173 (2004)
