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Received April 17, 2022
Accepted June 29, 2022
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Optical, structural and electrical properties of RuS2 thin films, obtained at low temperatures by spray pyrolysis
1Research and Technology Center of Energy, Borj-Cedria Science and Technology Park, Tunisia 2University of Carthage, Higher Institute of Environmental Science and Technology of Borj Cedria,, Borj-Cedria Science and Technology Park, Tunisia 3Physical Chemistry Laboratory of Mineral Materials and Their Applications, Technologic Park of Borj Cedria, Tunisia 4Institut de Recherche et Développement sur l'Energie Photovoltaïque (IRDEP), CNRS-EDF-Chimie Paris Tech Institut Photovoltaïque Ile de France (IPVF), 6 Quai Watier, 78401 Chatou, France 5, Tunisia
Korean Journal of Chemical Engineering, October 2022, 39(10), 2834-2841(8), 10.1007/s11814-022-1218-9
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Abstract
Aqueous ruthenium (III) chloride (RuCl3.3H2O) solution (0.03M) was sprayed on pre-heated ordinary glass substrates. Amorphous ruthenium oxide thin films were obtained, which were sulfurized under vacuum at several lower heat treatment temperatures (400, 450, 500 and 550 ℃) in RTP oven. The XRD results indicated the appearance of the RuS2 phase for all the sulfurization temperatures. The layer compositions were confirmed by EDS analysis. Monocrystalline and polycrystalline RuS2 thin films were obtained. SEM images showed mix of morphologies (filament, particles, and clusters) with porous surfaces. High absorption coefficients were deduced. The obtained RuS2-thin films showed different direct band gaps (1.43, 1.80, 1.79, 1.83 eV), which make it a distinct energy conversion and storage material. The opto-electrical properties of the as obtained RuS2-thin films make them among the best candidats for several applications, such as low cost material for low cost solar cells, and for alkaline hydrogen evolution electrocatalysts.
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Feng ZY, Yang Y, Zhang JM, J. Phys. Chem. Solids, 129, 227 (2019)
Eliche-Quesada D, Rodríguez-Castellón E, Jiménez-López A, Microporous Mesoporous Mater., 99, 268 (2007)
Aouine M, Geantet C, Epicier T, Catal. Today, 66(1), 91 (2001)
Skrabalak SE, Suslick KS, J. Am. Chem. Soc., 127(28), 9990 (2005)
Cai T, Song Z, Rodriguez JA, Hrbek J, J. Am. Chem. Soc., 126(29), 8886 (2004)
Ezzaouia H, Foise JW, Gorochov O, Mater. Res. Bull., 20(11), 1353 (1985)
Tomar N, Agrawal A, Dhaka VS, Surolia PK, Sol. Energy, 207, 59 (2020)
Holzwarth NAW, Harris S, Liang KS, Phys. Rev. B, 32(6), 3745 (1985)
Colell H, Alonso-Vante N, Electrochim. Acta, 38(14), 1929 (1993)
Kratzig A, Zachäus C, Brunken S, Thomas D, Bogdanoff P, Ellmer K, Fiechter S, Phys. Status Solidi A-Appl. Res., 211(9), 2020 (2014)
Luo W, Wang Y, Cheng C, Mater. Today Phys., 100274 (2020)
Passaretti JD, Collins RC, Wold A, Chianelli RR, Pecorara TA, Mater. Res. Bull., 14(9), 1167 (1979)
Le Nagard N, Bouanani A, Ezzaouia H, Gorochov O, J. Cryst. Growth, 104(2), 365 (1990)
Huang YS, Chen YF, Phys. Rev. B, 38(12), 7997 (1988)
Ouertani B, Ouerfelli J, Saadoun M, Bessaïs B, Ezzaouia H, Bernède JC, Sol. Energy Mater. Sol. Cells, 87, 501 (2005)
Ouertani B, Ouerfelli J, Saadoun M, Bessaïs B, Ezzaouia H, Bernède JC, Mater. Lett., 59, 734 (2005)
Ouertani B, Ezzaouia H, Theys B, Colloids Surf. A: Physicochem. Eng. Asp., 525, 13 (2017)
Ouertani B, Bidouk G, Ouertani R, Theys B, Ezzaouia H, Mater. Chem. Phys., 242, 122272 (2020)
Djatoubai E, Su J, Chem. Phys. Lett., 770, 138406 (2021)
Ouertani B, Boughzala H, Theys B, Ezzaouia H, J. Alloy. Compd., 871, 159490 (2021)
Patake VD, Lokhande CD, Appl. Surf. Sci., 254, 2820 (2008)
Bogdanoff P, Zachäus C, Brunken S, Kratzig A, Ellmer K, Fiechter S, Phys. Chem. Chem. Phys., 15(5), 1452 (2013)
Lin SS, Huang YS, Huang CR, Lee MC, Solid State Commun., 69(6), 589 (1989)
Bichsel R, Levy F, Berger H, J. Phys. Chem. Solids, 17(1), L19 (1984)
Mumtaz S, Warsi MF, Ashiq MN, Karamat N, Shakir I, Optoelectron. Adv. Mater.-Rapid Commun., 9, 404 (2015)
Mumtaz S, Ashiq M, Ahmad B, Ashiq MF, Gohar RS, Nazar N, Abdel-hafez SH, El-Sayed WA, Ahmad I, Appl. Phys. A-Mater. Sci. Process., 127(12), 1 (2021)
Bose DN, Seishu B, Parthasarathy G, Gopal ESR, Proc. R. Soc. A: Mathematical, Phys. Eng. Sci., 405, 345 (1829)