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SIMULATION OF SILICON FILM GROWTH BY SILANE DECOMPOSITION IN A MERCURY-SENSITIZED PHOTO-CVD PROCESS
Korean Journal of Chemical Engineering, January 1992, 9(1), 29-36(8), 10.1007/BF02697409
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Abstract
Deposition of silicon film by a mercury-sensitized photo-CVD process has been simulated by numerical solution of governing equations with proper boundary conditions. The results indicate that the film deposition rate is controlled by homogeneous decomposition of the reactant, silane, in the gas phase. The growth rate increases but the film uniformity decreases with the increase of reactant inlet concentration. Increase in the reactant flow rate decreases the deposition rate but gives no effect on the film uniformity. Among process variables, the light intensity and the mercury-saturator temperature are important parameters.
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Toyama M, Itoh H, Moriya T, Jpn. J. Appl. Phys., 25, 679 (1986)
Emeleus HJ, Stewart K, Trans. Faraday Soc., 32, 1577 (1936)
Kamaratos E, Lampe FW, J. Phys. Chem., 74, 2267 (1970)
Austin ER, Lampe FW, J. Phys. Chem., 81, 1134 (1977)
Perkins GGA, Lampe FW, J. Am. Chem. Soc., 102, 3764 (1980)
Matsui Y, Yuuki A, Morita N, Tachibana K, Jpn. J. Appl. Phys., 26, 1575 (1987)
Kmisako K, Imai T, Tarui Y, Jpn. J. Appl. Phys., 27, 1092 (1988)
Nishida S, Tasaki H, Konagai M, Takahashi K, J. Appl. Phys., 58(4), 1427 (1985)
Bird RB, Stewart WE, Light EN, "Transport Phenomena," John Wiley and Sons, Inc., New York (1960)
Lee JH, Moon SH, Rhee SW, Korean J. Chem. Eng., to submitted (1991)
Coltrin ME, Lee RJ, Miller JA, J. Electrochem. Soc., 131, 425 (1984)
Niki H, Mains GJ, J. Phys. Chem., 68, 304 (1964)
Tachibana K, Harima H, Matsui Y, Yuki A, Morita N, Urano Y, J. Phys. D: Appl. Phys., 20, 28 (1987)
Tompkins FC, "Chemisorption of Gases on Metals," Academic Press, London (1978)
Perrin J, Broekhuizen T, Appl. Phys. Lett., 50, 433 (1987)
Pun WM, Spalding DB, "A General Computer Program for Two-Dimensional Elliptic Flows," Imperial College of Science and Technology, London (1977)
Patankar SV, "Numerical Heat Transfer and Fluid Flow," Hemisphere Pub. Corporation, Washington (1980)
Abber RL, p. 270, "Handbook of Thin Film Deposition Processes and Techniques (ed. Schuegraf, K.K.)," Noyes Publications, Park Ridge, NJ (1988)
