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In relation to this article, we declare that there is no conflict of interest.
Publication history
Received August 26, 2024
Accepted November 1, 2024
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
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Sputtered Nickel Oxide Hole Transporting Layers for Perovskite Solar Cells

Korean Journal of Chemical Engineering, December 2024, 41(14), 3669-3676(8), https://doi.org/10.1007/s11814-024-00325-9

Abstract

Nickel oxide-based hole transporting layers have been widely adopted for the construction of p-i-n-structured perovskite solar

cells. So far, various techniques have been explored to successfully build nickel oxide layers, and the sputtering process could

be a strong one particularly in view of fi lm uniformity and scalability. In this review, we examined fundamental properties

and faced problems of the sputtered nickel oxide fi lms shown in perovskite solar cells. Proposed strategies to overcome the

current issues reported in the recent works on perovskite solar cells have been surveyed.

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