Korean J. Chem. Eng.
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ISSN 0256-1115
Online:
ISSN 1975-7220
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Issue
Total
1
articles [
키워드
:
Etching Mechanism
]
No.
Article
1
Korean Journal of Chemical Engineering
,
37
(2), pp.374-379 (2020)
Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas
Kim JH, Kim CK
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