| Issue |
| Total 1 articles [ 키워드: Ion-incidence Angle ] |
| No. | Article |
| 1 |
Korean Journal of Chemical Engineering, 37 (2), pp.374-379 (2020) Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas Kim JH, Kim CK |
| Print: | ISSN 0256-1115 |
| Online: | ISSN 1975-7220 |
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