ISSN: 0304-128X ISSN: 2233-9558
Copyright © 2024 KICHE. All rights reserved

Articles & Issues

Conflict of Interest
In relation to this article, we declare that there is no conflict of interest.
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright © KIChE. All rights reserved.

All issues

열풀라즈마를 이용한 탄화규소 분말의 합성

Thermal Plasma Synthesis of Silicon Carbide Powders

HWAHAK KONGHAK, August 1990, 28(4), 451-457(7), NONE
downloadDownload PDF

Abstract

열플라즈마를 발생시켜 얻은 초고온 아르곤기체에 삼염화메틸사일린[Si(CH3)Cl3]과 수소기체를 주입시켜 고온 화학반응에 의해 탄화규소 미세분말을 합성하였다. 이 때 최적 수소 농도는 3-4몰%로 나타났다. 이보다 적은 경우는 미반응 탄소분이 섞인 무정형의 탄소규소가 생성되는 것을 알았으며 큰 경우는 미반응 규소가 생성됨을 알았다. 이 공정에서 얻은 분말은 20-60nm의 크기를 가진 β-탄화규소로 나타났다.
Ultrafine silicon carbide powders were chemically synthesized by introducing trichloromethyl silane and hydrogen into the high temperature thermal plasma argon gas. The optimum concentration of hydrogen was found to be about 3-4mole%. Free carbon was included when the hydrogen concentration was lower than optimum and free silicon was formed when it was higher than optimum. It was also found out that powders synthesized were β-SiC with size distributions between 20 to 60nm.

Keywords

References

이시우, 박혁상, 요업재료의 과학과 기술, 3(4), 309 (1988)
Choi HK, Chem. Ind. Technol., 6(2), 176 (1988)
Kong P, Huang TT, Pfender E, IEEE Trans. Plasma Sci., 14(4), 357 (1986)
Hollabaugh CM, Hull DE, Newkirk LR, Petrovic JJ, J. Mater. Sci., 1(8), 3190 (1983) 
Mitsui A, Kato A, Yogyo-Kyogai-Shi, 94(5), 517 (1986)
Ando Y, Ohkohchi M, J. Cryst. Growth, 60, 147 (1982) 
Kato A, Ozeki T, Hojo J, J. Less-Common Metal., 92, L5 (1983) 
Kondo J, Saiki G, Ceramic Powder Science II, Messing, G.L., Fuller, E.R., Jr. and Hausner, H., eds., Am. Ceram. Soc., 285 (1988)
Young RM, Pfender E, Plasma Chem. Plasma Process., 5(1), 1 (1985) 

The Korean Institute of Chemical Engineers. F5, 119, Anam-ro, Seongbuk-gu, 233 Spring Street Seoul 02856, South Korea.
Phone No. +82-2-458-3078FAX No. +82-507-804-0669E-mail : kiche@kiche.or.kr

Copyright (C) KICHE.all rights reserved.

- Korean Chemical Engineering Research 상단으로