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Bismuth 박막으로 된 추가기록형 디스크에 대한 광 기록성
Optical Recording Characteristics for Write Once Disc of Bi Thin Film
HWAHAK KONGHAK, June 1994, 32(3), 348-357(10), NONE
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Abstract
DC/RF 마그네트론 스퍼터링 장치와 반도체 레이저를 사용하여 Bi 박막의 성막특성과 광 기록특성을 조사 하였다. Power밀도, 실퍼터링 시간, 아르곤 가스 유량이 증가할수록, 폴리카보네이트 기판과 Bi 티켓간의 거리가 감소할수록 성막된 필름의 두께는 증가함을 알 수 있었다. 레이저로 가록하기 전에 1000-3500Å의 필름 두께에 대하여 47%의 반사율이 얻어졌다. 또한 Red Book에 규정된 표준 피트 길이와 비교하여, 측정된 피트 길이는 다소 작은 것으로 나타났다.
The deposition and optical recording characteristics of Bi thin film were investigated using the DC/RF magnetron sputtering unit and the semiconductor laser. It was found that the deposited film thickness increased with increasing power density, sputtering time, argon gas flow rate and decreasing distance between the polycarbonate substrate and Bi target. Before the laser marking, the reflectance of 47% was obtained for the film thickness ranging from 1000 to 3500Å. Also, in comparison with the standard pit length defined by the Red Book, it was shown that the measured pit length was somewhat small.
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Bartolini RA, Weakliem HA, Williams BF, Opt. Eng., 15, 99 (1976)
Carlson CO, Stone E, Bernstein HL, Tomita WK, Myers WC, Science, 154, 1550 (1966)
Sard R, Maydan D, J. Appl. Phys., 42, 5084 (1971)
Terao M, Shigematsu K, Ojima M, Tiniguchi Y, Horigome S, Yonezawa S, J. Appl. Phys., 50, 6881 (1979)
Kivits P, DeBont R, Appl. Phys., 24, 307 (1981)
Lou DY, Blom GM, Kenney GC, J. Vac. Sci. Technol., 18, 78 (1981)
Suh SY, Proc. Soc. Photo-Opt. Instrum. Eng., 382, 196 (1983)
Wrobel J, Marchant A, Howe D, Appl. Phys. Lett., 40, 928 (1982)
Ohta T, Kotera K, Kimura K, Akahira N, Takengawa M, SPIE Proc., 695, 2 (1986)
Grove WR, Phil. Mag., 5, 203 (1853)
Nakahara S, Hong M, vanDover RB, Gyorgy EM, Bacon DD, J. Vac. Sci. Technol. A, 4(3), 543 (1986)
Wasa K, Hayakawa S, Thin Solid Films, 52, 31 (1978)
Maissel LI, Glang R, "Handbook of Thin Film Technology," McGraw-Hill, New York (1970)
