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플라즈마 중합된 Trifluoromethane막의 플라즈마 표면개질
Plasma Surface Modification of Plasma Polymerized Trifluoromethane Films
HWAHAK KONGHAK, August 1998, 36(4), 530-535(6), NONE
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Abstract
Ar, O2, N2 등의 플라즈마 처리를 이용한 CHF3(trifluoromethane) 플라즈마 고분자의 표면개질이 생성된 표면 기능성 그룹과 친수성 성향과의 관점에서 조사되었다. 플라즈마 처리된 CHF3(trifluoromethane) 플라즈마 고분자 표면은 카보닐, 카복실, 알데히으 등의 산소 기능성 그룹들이 생성되었고, 표면 산소 함유량과 O/C 비의 증가를 나타내었다. 또한 rf-플라즈마 반응기에서 플라즈마 처리된 CHF3 플라즈마 고분자의 친수성 표면에 미치는 공정변수의 영향을 결정하였다. CHF3 플라즈마 고분자의 접촉각은 rf-출력과 처리시간의 증가에 따라 감소하는 경향을 나타내었다. 플라즈마 처리에 의해 CHF3 플라즈마 고분자가 친수성으로 개질되었음을 확인하였으며, 친수성 표면개질 반응의 최적조건은 복합 매개변수[(W/FM)t] 300-400(GJs/kg)부근임을 알 수 있었다.
The surface modification of plasma polymerized CHF3 by Ar, O2, and N2 plasmas treatment was investigated from the point of view of the hydrophilicity and the functionality of the generated surface. The surface treated with plasma was generated carbonyl, carboxyl, and aldehyde groups and showed the increase in the oxygen content and O/C atomic ratio. Also, the effects of process parameters on the hydrophilic surface of the plasma treated plasma polymerized CHF3 have been determined in rf-plasma reactor. The contact angle of plasma polymerized CHF3 decreased with increasing rf-power and treatment time. It was found that the plasma polymerized CHF3 was hydrophilic surface, and the optimum condition for hydrophilic surface modification was 300-400(GJs/kg), in the composite parameter[(W/FM)t].
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