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Ni3Al 금속간화합물 첨가에 따른 MCFC용 다공성 Ni 소재 양극내 Ni 결정립 성장 억제 특성
Effect of Ni3Al Intermetallic Compound Inclusion on Ni Grain Growth Inhibition in MCFC Porous Ni-Base Anode
HWAHAK KONGHAK, February 1999, 37(1), 97-102(6), NONE
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Abstract
주성분이 Ni 입자로 된 용융탄산염 연료전지 다공성 Ni소재 양극에 4-l0wt%의 Ni3Al 금속간화합물을 첨가하여 소결함으로써 다공성 양극내 Ni 결정립 성장 억제에 대한 Ni3Al의 영향을 조사하였다. 첨가된 Ni3Al 금속간화합물의 Ni 입계 이동 억제작용 및 Ni 입자 표면을 통한 확산에 따른 표면적 감소에 의하여 Ni 결정립 성장이 억제되어 비교적 작고 균일한 결정립으로 유지되었다. Ni 결정립 성장속도는 순수한 다공성 Ni 양극에 비하여 상당히 낮아 소결시간의 0.22승에 비례하고 MCFC전극반응에 적합한 3-6μm의 기공을 갖고 있음을 확인하였다.
The effect of Ni3Al on Ni grain growth inhibition were investigated by sintering experiment of MCFC porous Ni-base anode made of 4-10 wt% Ni3Al intermetallic compound. Ni grain growth is retarded and Ni grain maintains small uniform size for Ni3Al particle's pinning effect on Ni grain boundary movement and surface area reduction by surface diffusion between Ni particles. It is found that the Ni grain growth rate of porous anode included Ni3Al follows the following kinetic law, G - G0=Ktm with m=0.22 which is lower value compared with that of pure Ni anode and the pore size is 3 to 6 μm compatible with the electrochemical reaction of the MCFC.
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German RH, "Sintering Theory and Practice," John Wiley and Sons, NY (1996)
Liu Y, Patterson BR, Acta Mater., 44(11), 4327 (1996)
Rahaman MN, "Ceramic Processing and Sintering," Marcel Dekker, NY (1995)
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Gao J, Thompson RG, Patterson BR, Acta Mater., 45(9), 3653 (1997)
