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프탈로시아닌 유기물 반도체를 이용한 NO2 가스 센서
Phthalocyanine Organic Semiconductor for NO2 Gas Sensor
HWAHAK KONGHAK, October 1999, 37(5), 639-645(7), NONE
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Abstract
여러 금속 프탈로시아닌을 이용한 NO2 가스 센서가 진공도 2*10-5 torr, 증착온도 390oC에서 진공 증착법에 의해서 제조되었다. 여러 금속 프탈로시아닌 중에서 PbPc박막이 5 ppm NO2 농도에서 80% 이상의 가장 좋은 감도를 나타냈으며, PbPc 박막 구조는 tri, mono-clinic이 혼합되어 있는 것으로 나타났다. 응답 및 회복 시간을 포함한 최적의 동작 조건과 NO2 가스의 연속적인 흡, 탈찰 특성이 파악되었고, 수분을 포하한 여러 가지 산화, 환원성 가스에 대한 선택성을 비교검토하였다.
NO2 gas sensors using various metal phthalocyanines were prepared by vacuum sublimation method at 390oC to test the electrical properties of the sensors in the presence of NO2 gas. Among the sensors prepared in the present study, a lead phthalocyanine(PbPc) thin film showed the best performance and its sensitivity was over 80% at 5 ppm of NO2 gas. The structure of PbPc thin film was a mixture of tri and mono-clinic crystal phases. Optimal operating conditions including response time, cyclic treatment of NO2 gas, and selectivity of various reduction and oxidation gases were developed and examined.
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Parr ATJ, Krier A, Collins RA, Thin Solid Films, 230, 225 (1993)
Kanefusa S, Nitta M, Mater. Lett., 18, 349 (1989)
Kanamori M, Okamoto Y, Ohya Y, Takahashi Y, J. Ceram. Soc. Jpn., 103(2), 113 (1995)
Matsushima S, Kunitsugu S, Kobayashi K, Okada G, J. Ceram. Soc. Jpn., 103(3), 302 (1995)
Lampe U, Gerblinger J, Meixner H, Sens. Actuators B-Chem., 26 (1995)
Matsushima S, Ikeda D, Kobayashi K, Okada G, Sens. Actuators B-Chem., 13-14, 621 (1993)
Akiyama M, Tamaki J, Miura N, Yamazoe N, Chem. Lett., 1611 (1991)
Nakamura Y, Ishikawa S, Koyama R, Yamagina H, J. Ceram. Soc. Jpn., 102(3), 273 (1994)
Kudo S, Ohnishi H, Matsumoto T, Ippommatsu M, Sens. Actuators B-Chem., 23, 219 (1995)
Moriya K, Enomoto H, Nakamura Y, Sens. Actuators B-Chem., 13-14, 412 (1993)
Miura N, Yao S, Shimizu Y, Yamazoe N, Sens. Actuators B-Chem., 13-14, 387 (1993)
Capobianchi A, Paoletti AM, Pennesi G, Rossi G, Sens. Actuators B-Chem., 48, 333 (1998)
Bott B, Jones TA, Sens. Actuators B-Chem., 5, 43 (1984)
Gould RD, Coodination Chem. Rev., 156, 237 (1996)
Azim-Araghi ME, Krier A, Abass, Semicond. Sci. Technol., 12, 1625 (1997)
Kim SR, Choi SA, Kim JD, Choi KH, Park SK, Chang YH, Synth. Met., 71, 2293 (1995)
Seiyama T, Denki Kagaku, 40(3), 244 (1972)
Collins RA, Belghachi A, Mater. Lett., 8, 349 (1989)
Collins RA, Krier A, Abass AK, Thin Solid Films, 229, 113 (1993)
Campbell D, Collins RA, Phys. Stat. Sol., 152(a), 431 (1995)
Miyamoto A, Nichogi K, Taomoto A, Nambu T, Murakami M, Thin Solid Films, 256(1-2), 64 (1995)
Parr ATJ, Krier A, Collins RA, Thin Solid Films, 230, 225 (1993)
Kanefusa S, Nitta M, Mater. Lett., 18, 349 (1989)
