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염화 제2철 용액에 의한 Shadow Mask의 식각에 관한 연구

Studies on the Ferric Chloride Etching of Shadow Masks

영남대학교 응용화학공학부 1(주)LG마이크론 기술연구소
School of Chemical Engineering & Technology, Yeungnam University, Korea 1Technical Research Laboratory, LG Micron Co., Ltd., Korea
HWAHAK KONGHAK, June 2000, 38(3), 393-397(5), NONE
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Abstract

염화 제2철 용액을 사용하여 aluminum-killed(AK) 철 및 Invar 합금의 식각에 관한 연구를 수행하였다. 공정 변수들 즉, 식각 용액의 온도, Fe3+ 이온농도, 비중(Baume) 및 유리산도가 식각 속도에 미치는 영향을 각각 조사하였고, 그 결과 AK 철과 Invar 합금의 식각 반응이 1차 반응식을 따르고 있음을 알 수 있었다. 식각 후 표면의 거칠기는 식각 용액의 Baume가 증가할수록 개선됨을 알 수 있었고, 유리산도가 식각 속도에 미치는 영향은 조사된 범위 내에서는 미미함을 알 수 있었다. 공정 모델링을 통해 유도된 식각 속도식의 계산 결과는 실험결과와 비교되었으며 이들은 매우 잘 일치하였다.
The ferric chloried etching of aluminum-killed(AK) steel and Invar alloy was studied. The effect of process parameters(i.e, etchant temperature, Fe3+ ion concentration, specific gravity (Baume),and free HCl concentration) on the etch rate was investigated, and the results showed that the etching reaction of AK steel and Invar alloy follow the first-order kinetics. Roughness of the etched surface was improved when the etchant Baume was increased. The change in free HCl concentration did not affect the etch rate significantly within the range covered in this study. The experimental data were compared with the calculations from process modeling, and they were in good agreement.

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