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미세다공성 RuO2-ZrO2 복합 금속 산화물 전극의 제조
The Preparation of Microporous RuO2-ZrO2 Mixed Metal Oxide Electrodes
중앙대학교 화학공학과, 서울 156-756 1한화그룹종합연구소 신소재연구센터, 대전 305-345
Department of Chemical Engineering, Chung-Ang University, 221 Huksuk-Dong, Dongjak-Ku, Seoul 156-756, Korea 1Department of Chemical Engineering, Hanwha Group R&E Center, 6 Shinsung-Dong, Yusong-Ku, Taejon 305-345, Korea
HWAHAK KONGHAK, June 2000, 38(3), 405-410(6), NONE
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Abstract
Zirconium propoxide를 전구체로 하고 질산을 안정화제로 하여 건조조절제 없이 졸-겔 공정으로 Zr(OCH2CH2CH3)4:C2H5OH:H2O:HNO3=1:50:4:0.16의 조성에서 안정하고 균질한 ZrO2 졸을 얻었으며 dipping법으로 티타늄 기판 위에 코팅하고 450℃에서 열처리하여 RuO2-ZrO2/Ti 복합 금속 산화물 전극을 제조하였다. XRD 분석으로 ZrO2는 tetragonal 구조이고 RuO2는 rutile 구조임을 확인할 수 있었으며 복합 금속 산화물에서 RuO2와 ZrO2의 intensity는 각각의 조성에 비례하였다. ZrO2의 첨가로 비표면적이 증가하였으며, 40%이상의 RuO2를 함유하는 복합 금속 산화물 전극에서는 균열을 발견할 수 없었다. 40%의 RuO2를 함유하는 RuO2-ZrO2/Ti 복합 금속 산화물 전극에서 열분해법으로 얻은 RuO2/Ti 전극에 비하여 높은 비표면적과 함께 산소 발생 반응에 대하여 상대적으로 높은 교환 전류 밀도와 낮은 과전압을 얻을 수 있었다.
Without drying control chelating agent, stable and uniform zirconia sol was obtained at Zr(OCH2CH2CH3)4:C2H5OH:H2O:HNO3=1:50:4:0.16. RuO2-ZrO2/Ti mixed metal oxide electrodes were obtained by dip-coating on titanium substrate. The X-ray diffraction patterns of metal oxides fired at 450℃ conformed a tetragonal-type ZrO2 and a rutile-type RuO2 regardless of oxide composition. Intensity of XRD varied linearly with oxide compositions. By addition of ZrO2 the specific surface area increased. Mixed metal oxide electrodes containing RuO2 more than 40% exhibited no crack and uniform coating surface. The mixed metal oxide electrode containing 40% RuO2 showed higher exchange current density and lower overpotential for the oxygen evolution with higher specific surface area compared to RuO2/Ti electrode prepared by a thermal decomposition.
Keywords
References
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Camara OR, Trasatti S, Electrochim. Acta, 41(3), 419 (1996)
Boodts JFC, Trasatti S, J. Electrochem. Soc., 137, 3784 (1990)
Kameyama K, Tsukada K, Yahikozawa K, Takasu Y, J. Electrochem. Soc., 141(3), 643 (1994)
Tanabe K, Mat. Chem. Phys., 13, 347 (1985)
Hammett A, Stevens P, Troughton GL, Catal. Today, 7, 219 (1990)
Ardizzone S, Bassi G, Mat. Chem. Phys., 25, 417 (1990)
Randon J, Larbot A, Guizard C, Cot L, Lindheimer M, Partyka S, Colloid Surf., 52, 241 (1991)
Comninellis C, Vercesi GP, J. Appl. Electrochem., 21, 335 (1991)
Subramanian K, Guruviah S, Bull. Electrochem., 2, 561 (1986)
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Hwang K, Ko H, Yeu T, HWAHAK KONGHAK, 37(5), 725 (1999)
Bard AJ, Faulkner LR, "Electrochemical Methods Fundamentals and Applications," John Wiley & Sons, New York (1980)
