Articles & Issues
- Language
- korean
- Conflict of Interest
- In relation to this article, we declare that there is no conflict of interest.
- Publication history
-
Received December 31, 2004
Accepted April 2, 2005
-
This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits
unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright © KIChE. All rights reserved.
All issues
전기적 특성을 이용한 UV 경화 프로세스에 대한 새로운 평가방법
A New Evaluation Method of UV Curing Process by Using Electrical Properties
시립인천전문대학 화상인쇄과, 402-750 인천시 남구 도화2동 235 1부경대학교 공과대학 화상정보공학부, 608-739 부산시 남구 용당동 산100 2부경대학교 응용화학공학부, 608-739 부산시 남구 용당동 산100
Department of Image Printing, Incheon City College, 235, Dohwa-2dong, Nam-gu, Incheon 402-750, Korea 1Division of Image & Information Engineering College of Engineering, Pukyong National University, San 100, Yongdang-dong, Nam-gu, Busan 608-739, Korea 2Division of Applied Chemical Engineering, Pukyong National University, San 100, Yongdang-dong, Nam-gu, Busan 608-739, Korea
mocja@chol.com
Korean Chemical Engineering Research, June 2005, 43(3), 393-400(8), NONE Epub 7 July 2005
Download PDF
Abstract
산증식제가 가지고 있는 산증식 능력을 측정하기 위한 새로운 평가 방법이 연구되어지고 있다. 그 방법은 UV 조사에 따른 산의 발생으로 인한 전도도 변화를 측정하는 것에 그 원리를 두고 있다. 본 연구자는 실험을 통해 다음과 같은 사실을 알 수 있었다. Inks film의 UV 경화반응 동안의 epoxy monomer의 광중합과 UV 경화율에 의해 전기 전도도가 감소하게 된다는 것이다. 본 논문에서는 새로운 산증식제를 합성하고, 합성된 산증식제의 열적 안정성을 DSC로 측정하였다. 여기서는 mono-type의 산증식제가 di-type의 산증식제보다 열적으로 더 안정하였다. 이러한 결과를 바탕으로 경화과정에 있어 UV 경화형 ink의 경화속도를 동적으로 평가할 수 있었다.
A novel evaluation method was investigated for measuring the ability of acid amplification of acid amplifier.The method was based on the measurement of conductivity change by the acid generation according to UV radiation. It was found that the decrease of conductivity was caused by photopolymerization of epoxy monomer during UV curing process of ink film and by the rate of UV curing. In this paper, the novel acid amplifiers were synthesized and measured thermal stability by means of DSC. It was found that mono-type acid amplifiers were more stable than di-type. It was possible to make the dynamical evaluation of the curing rate of UV curable ink in curing process by this method.
References
Fishman D, UV/EB Ink & Coatings, American Ink Maker, 49-53 (1993)
Tai K, "UV Printing Inks", Bulletin of the Japanese Society of Printing Science and Technology, 31(2), 116 (1994)
Adachi N, Serisawa I, Tada S, Takahashi Y, "New evaluation of UV curing process by change electric conduction", Bulletin of The Japanese Society of Printing Science and Technology,, 32(1), 28 (1995)
Adachi N, Serisawa I, Tada S, Takahashi Y, Bull. Jpn. Society of Printing Science and Technology, 33(1), 307 (1996)
Lee MH, Lee TH, Kim SB, Son SM, J. Korean Printing Society, 21(2), 55 (2003)
Jager W, Neckers DC, photoinitiation for Polymerization: UV & EB at the Millennium, SITA Technology Limited Nelson Housem, London (2000)
Techno-net Co., Using Guide of Photo-Curing Technology, Technonet Co., Tokyo (2001)
Ichimura K, J. Functional Material(Japan), 20-6 (2000)
Allen (ed.) N., Photopolymerisation and photoimaging science and technology, Elsevier Science Publishers LTD., New York, 57-66 (1989)
Boeden(edit.) M. J., Thompson L. F. and Willson C. G., Introduction to Microlithgraphy, 2nd. ed. (1994)
Tai K, "UV Printing Inks", Bulletin of the Japanese Society of Printing Science and Technology, 31(2), 116 (1994)
Adachi N, Serisawa I, Tada S, Takahashi Y, "New evaluation of UV curing process by change electric conduction", Bulletin of The Japanese Society of Printing Science and Technology,, 32(1), 28 (1995)
Adachi N, Serisawa I, Tada S, Takahashi Y, Bull. Jpn. Society of Printing Science and Technology, 33(1), 307 (1996)
Lee MH, Lee TH, Kim SB, Son SM, J. Korean Printing Society, 21(2), 55 (2003)
Jager W, Neckers DC, photoinitiation for Polymerization: UV & EB at the Millennium, SITA Technology Limited Nelson Housem, London (2000)
Techno-net Co., Using Guide of Photo-Curing Technology, Technonet Co., Tokyo (2001)
Ichimura K, J. Functional Material(Japan), 20-6 (2000)
Allen (ed.) N., Photopolymerisation and photoimaging science and technology, Elsevier Science Publishers LTD., New York, 57-66 (1989)
Boeden(edit.) M. J., Thompson L. F. and Willson C. G., Introduction to Microlithgraphy, 2nd. ed. (1994)
