Articles & Issues
- Language
- korean
- Conflict of Interest
- In relation to this article, we declare that there is no conflict of interest.
- Publication history
-
Received September 11, 2006
Accepted September 13, 2006
- This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright © KIChE. All rights reserved.
All issues
반복학습제어를 기반으로 한 회분공정의 고급제어기법
Advanced Control Techniques for Batch Processes Based on Iterative Learning Control Methods
서강대학교 화공생명공학과, 121-742 서울시 마포구 신수동 1
Depart. of Chem. and Biomol. Engng., Sogang Univ., 1, Shinsoo-dong, Mapo-gu, Seoul 121-742, Korea
kslee@sogang.ac.kr
Korean Chemical Engineering Research, October 2006, 44(5), 425-434(10), NONE Epub 14 November 2006
Download PDF
Abstract
석유화학공업으로 대표되는 공정산업의 연속공정들은 지난 20여 년간 모델예측제어를 중심으로 고급제어(APC)기법들이 도입되며 운전성 및 생산성 향상에 많은 진보를 이루었다. 이에 반하여 중합반응기를 비롯한 각종 회분공정에는 APC 기법의 도입이 아직 활발히 이루어지지 않고 있다. 이것은 회분공정의 독특한 문제점을 극복하며 원하는 성능을 보장할 수 있는 방법론이 제시되지 못한 데에 가장 큰 이유가 있다고 할 수 있다. 그러나 최근 이러한 문제점들을 극복할 수 있는 APC 기법들이 반복학습제어(ILC)에 근거하여 개발되며 회분공정 APC 환경에 큰 변화가 일어나고 있다. 본 논문에서는 이들 기법들이 다양한 실제 공정에 활발하게 적용되어 운전을 개선할 수 있기를 기대하며, ILC를 기반으로 한 최근의 회분공정 APC 연구동향을 이론과 실례를 통해 소개한다.
The operability and productivity of continuous processes, especially in petrochemical industries have made remarkable improvement during the past twenty years through advanced process control (APC) typified by model-based predictive control. On the other hand, APC have not been actively practiced in industrial batch processes typified by batch polymerization reactors. Perhaps the main cause for this has been the lack of reliable batch process APC techniques that can overcome the unique problems in industrial batch processes. Recently, some noteworthy progress is being made in this area. New high-performance batch process control techniques that can accommodate and also overcome the unique problems of industrial batch processes have been proposed on the basis of iterative learning control(ILC). In this review paper, recent advancement in the batch process APC techniques are presented, with a particular focus on the variations of the so called Q-ILC method, with the hope that they are widely practiced in different industrial batch processes and enhance their operations.
References
Morari M, Lee JH, Comput. Chem. Eng., 23, 667 (1996)
Qin SJ, Badgwell TA, Control Eng. Practice, 11, 733 (2003)
Song IH, Rhee HK, Ind. Eng. Chem. Res., 43(23), 7261 (2004)
Rantow FS, Soroush M, Grady MC, “Optimal Control of a High-Temperature Semi-Batch Solution Polymerization Reactor,” Proceedings of the 2005ACC, Portland, USA, 3102, June (2005)
Sheibat-Othman N, Othman S, Ind. Eng. Chem. Res., 45(1), 206 (2006)
Cetinkaya S, Zeybek Z, Hapoglu H, Alpbaz M, Comput. Chem. Eng., 30, 1315 (2006)
Hua XM, Rohani S, Jutan A, Chem. Eng. Sci., 59(24), 5695 (2004)
Arpornwichanop A, Kittisupakorn P, Mujtaba IM, Chem. Eng. Process., 4, 101 (2005)
Bouhenchir H, Cabassud M, Le Lann MV, Comput. Chem. Eng., 30, 1141 (2006)
Pieri F, Caccavale F, Iamarino M, Tufano V, “A Controller-Observer Scheme for Adaptive Control of Chemical batch Reactors,” Proceedings of the 2006 ACC, Minneapolis, USA, 5524, June (2006)
Ma DL, Tafti LK, Braatz RD, Comput. Chem. Eng., 26, 1103 (2002)
Costa CBB, da Costa AC, Maciel R, Chem. Eng. Process., 44(7), 737 (2005)
Voller U, Raisch J, Chem. Eng. Process., 45, 874 (2006)
Costa CBB, Maciel R, Chem. Eng. Sci., 60(19), 5312 (2005)
Vu TTL, Durham RJ, Hourigan JA, Sleigh RW, Sep. Purif. Technol., 48, 159 (2006)
Oisiovici RM, Cruz SL, Ind. Eng. Chem. Res., 40(12), 2628 (2001)
Ulas S, Diwekar UM, Stadtherr MA, Comput. Chem. Eng., 29, 1805 (2005)
Da L, Kumar VG, Tay A, Al Mamun A, Weng KH, See A, Chan L, “Run-to-run Process Control for Chemical Mechanical Polishing in Semiconductor Manufacturing,” Proceedxings of the 2002 IEEE Int. Sym. on Intelligent Control, 740-745, Vancouver, Canada (2002)
Emami-Naeini A, Ebert JL, Kosut RL, de Roover D, Ghosal S, “Model-based Control for Semiconductor and Advanced Materials Processing: an Overview,” Proceedings of the 2004ACC, 5, 3902-3909, Boston, USA (2004)
Matsumoto K, Suzuki K, Kunimatsu S, Fujii T, “Temperature Control of Wafer in Semiconductor Manufacturing Systems by MR-ILQ Design Method,” Proceedings of 2004 IEEE Int. Conf. on Control Appl., 2, 1410-1414, Taipei, Taiwan (2004)
Garden M, “Learning Control of Actuators in Control System,” U.S. Patent No. 3,555,252 (1971)
Miller RC, Mallick GT, “Method of Controlling an Automatic Machine Tool,” U.S. Patent No. 4,088,899 (1978)
Uchiyama M, Trans. of the Society of Instrum. and Control Eng., 19, 706 (1978)
Arimoto S, Kawamura S, Miyazaki F, J. of Robotic Systems, 1, 123 (1984)
Bien Z, Huh KM, IEE Proc. Part D on Control Theory and Appl., 136, 105 (1989)
Lee KS, Lee JH, J. Process Control, 13(7), 607 (2003)
Ahn H, Chen Y, Moore K, “Iterative Learning Control: Brief Syrvey and Catgorization 1998-2004,” IEEE Trans. Systems, Man and Cybernetics-Part C: Applications and Reviews, Accepted for Publication (2006)
Lee JH, Lee KS, Kim WC, Automatica, 36(5), 641 (2000)
Lee KS, Lee J, Chin I, Choi J, Lee JH, Ind. Eng. Chem. Res., 40(7), 1661 (2001)
Lee KS, Chin IS, Lee HJ, Lee JH, AIChE J., 45(10), 2175 (1999)
Chin IS, Lee KS, Lee JH, Ind. Eng. Chem. Res., 39(3), 693 (2000)
Chin I, Qin SJ, Lee KS, Cho M, Automatica, 40(11), 1913 (2004)
Cho M, Lee Y, Joo S, Lee KS, IEEE Trans. On Semicon. Manuf., 18, 430 (2005)
Lee JH, Lee KS, “Iterative Learning Control Applied to Batch Processes: An Overview,” accepted for publication in Control Eng. Practice (2006)
Roesser R, IEEE Trans. A.C., 20, 1 (1975)
Kaczorek T, Two-Dimensional Linear Systems, Springer-Verlag, Berlin (1985)
Kurek JE, Zaremba MB, IEEE Trans. A.C., 38, 121 (1993)
Shi J, Gao F, Wu TJ, Ind. Eng. Chem. Res., 45, 4617 (2006)
Chen YH, Su AJ, Shiu SJ, Yu CC, Shen SH, Ind. Eng. Chem. Res., 44(13), 4676 (2005)
Firth SK, Campbell WJ, Toprac A, Edgar TF, IEEE Trans. On Semicon. Manuf, 19, 298 (2006)
Wilde DJ, Beightler CS, Foundations of Optimization, Prentice-Hall, Englewood-Cliffs (1967)
Zafiriou E, Zhu JM, “Optimal Control of Semi-Batch Processes in the Presence of Modeling Error,” Proc. of 1990 ACC., San Diego, USA, 1644-1649 (1990)
Zafiriou E, Adomaitis RA, Gattu G, “ Approach to Runto-Run Control for Rapid Thermal Processing,” Proc. of 1995 ACC., Seattle, USA, 1286-1288 (1995)
Hara S, Yamamoto Y, Omata T, Nakano N, IEEE Trans. A.C., 33, 659 (1998)
Lee JH, Natarajan S, Lee KS, J. Process Control, 11(2), 195 (2001)
Qin SJ, Badgwell TA, Control Eng. Practice, 11, 733 (2003)
Song IH, Rhee HK, Ind. Eng. Chem. Res., 43(23), 7261 (2004)
Rantow FS, Soroush M, Grady MC, “Optimal Control of a High-Temperature Semi-Batch Solution Polymerization Reactor,” Proceedings of the 2005ACC, Portland, USA, 3102, June (2005)
Sheibat-Othman N, Othman S, Ind. Eng. Chem. Res., 45(1), 206 (2006)
Cetinkaya S, Zeybek Z, Hapoglu H, Alpbaz M, Comput. Chem. Eng., 30, 1315 (2006)
Hua XM, Rohani S, Jutan A, Chem. Eng. Sci., 59(24), 5695 (2004)
Arpornwichanop A, Kittisupakorn P, Mujtaba IM, Chem. Eng. Process., 4, 101 (2005)
Bouhenchir H, Cabassud M, Le Lann MV, Comput. Chem. Eng., 30, 1141 (2006)
Pieri F, Caccavale F, Iamarino M, Tufano V, “A Controller-Observer Scheme for Adaptive Control of Chemical batch Reactors,” Proceedings of the 2006 ACC, Minneapolis, USA, 5524, June (2006)
Ma DL, Tafti LK, Braatz RD, Comput. Chem. Eng., 26, 1103 (2002)
Costa CBB, da Costa AC, Maciel R, Chem. Eng. Process., 44(7), 737 (2005)
Voller U, Raisch J, Chem. Eng. Process., 45, 874 (2006)
Costa CBB, Maciel R, Chem. Eng. Sci., 60(19), 5312 (2005)
Vu TTL, Durham RJ, Hourigan JA, Sleigh RW, Sep. Purif. Technol., 48, 159 (2006)
Oisiovici RM, Cruz SL, Ind. Eng. Chem. Res., 40(12), 2628 (2001)
Ulas S, Diwekar UM, Stadtherr MA, Comput. Chem. Eng., 29, 1805 (2005)
Da L, Kumar VG, Tay A, Al Mamun A, Weng KH, See A, Chan L, “Run-to-run Process Control for Chemical Mechanical Polishing in Semiconductor Manufacturing,” Proceedxings of the 2002 IEEE Int. Sym. on Intelligent Control, 740-745, Vancouver, Canada (2002)
Emami-Naeini A, Ebert JL, Kosut RL, de Roover D, Ghosal S, “Model-based Control for Semiconductor and Advanced Materials Processing: an Overview,” Proceedings of the 2004ACC, 5, 3902-3909, Boston, USA (2004)
Matsumoto K, Suzuki K, Kunimatsu S, Fujii T, “Temperature Control of Wafer in Semiconductor Manufacturing Systems by MR-ILQ Design Method,” Proceedings of 2004 IEEE Int. Conf. on Control Appl., 2, 1410-1414, Taipei, Taiwan (2004)
Garden M, “Learning Control of Actuators in Control System,” U.S. Patent No. 3,555,252 (1971)
Miller RC, Mallick GT, “Method of Controlling an Automatic Machine Tool,” U.S. Patent No. 4,088,899 (1978)
Uchiyama M, Trans. of the Society of Instrum. and Control Eng., 19, 706 (1978)
Arimoto S, Kawamura S, Miyazaki F, J. of Robotic Systems, 1, 123 (1984)
Bien Z, Huh KM, IEE Proc. Part D on Control Theory and Appl., 136, 105 (1989)
Lee KS, Lee JH, J. Process Control, 13(7), 607 (2003)
Ahn H, Chen Y, Moore K, “Iterative Learning Control: Brief Syrvey and Catgorization 1998-2004,” IEEE Trans. Systems, Man and Cybernetics-Part C: Applications and Reviews, Accepted for Publication (2006)
Lee JH, Lee KS, Kim WC, Automatica, 36(5), 641 (2000)
Lee KS, Lee J, Chin I, Choi J, Lee JH, Ind. Eng. Chem. Res., 40(7), 1661 (2001)
Lee KS, Chin IS, Lee HJ, Lee JH, AIChE J., 45(10), 2175 (1999)
Chin IS, Lee KS, Lee JH, Ind. Eng. Chem. Res., 39(3), 693 (2000)
Chin I, Qin SJ, Lee KS, Cho M, Automatica, 40(11), 1913 (2004)
Cho M, Lee Y, Joo S, Lee KS, IEEE Trans. On Semicon. Manuf., 18, 430 (2005)
Lee JH, Lee KS, “Iterative Learning Control Applied to Batch Processes: An Overview,” accepted for publication in Control Eng. Practice (2006)
Roesser R, IEEE Trans. A.C., 20, 1 (1975)
Kaczorek T, Two-Dimensional Linear Systems, Springer-Verlag, Berlin (1985)
Kurek JE, Zaremba MB, IEEE Trans. A.C., 38, 121 (1993)
Shi J, Gao F, Wu TJ, Ind. Eng. Chem. Res., 45, 4617 (2006)
Chen YH, Su AJ, Shiu SJ, Yu CC, Shen SH, Ind. Eng. Chem. Res., 44(13), 4676 (2005)
Firth SK, Campbell WJ, Toprac A, Edgar TF, IEEE Trans. On Semicon. Manuf, 19, 298 (2006)
Wilde DJ, Beightler CS, Foundations of Optimization, Prentice-Hall, Englewood-Cliffs (1967)
Zafiriou E, Zhu JM, “Optimal Control of Semi-Batch Processes in the Presence of Modeling Error,” Proc. of 1990 ACC., San Diego, USA, 1644-1649 (1990)
Zafiriou E, Adomaitis RA, Gattu G, “ Approach to Runto-Run Control for Rapid Thermal Processing,” Proc. of 1995 ACC., Seattle, USA, 1286-1288 (1995)
Hara S, Yamamoto Y, Omata T, Nakano N, IEEE Trans. A.C., 33, 659 (1998)
Lee JH, Natarajan S, Lee KS, J. Process Control, 11(2), 195 (2001)