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Received November 3, 2010
Accepted December 9, 2010
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
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실리콘 나노리본을 이용한 유연한 패시브 매트릭스 소자 제작

Fabrication of Flexible Passive Matrix by Using Silicon Nano-ribbon

고려대학교 화공생명공학과, 136-713 서울특별시 성북구 안암동 5가
Chemical and Biological Engineering, Korea University, 5-ga, Anam-dong, Seongbuk-gu, Seoul 136-713, Korea
jeongsha@korea.ac.kr
Korean Chemical Engineering Research, June 2011, 49(3), 338-341(4), NONE Epub 8 June 2011
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Abstract

대표적인 반도체 소재인 실리콘을 유연소자로 이용하기 위하여 매우 얇은 나노리본 형태로 제작하였다. p-타입과 n-타입 도핑 그리고 고유한 영역으로 구성된 실리콘 소자(p-i-n 접합소자)를 가로/세로 100라인씩 연결하여 총 10,000개의 어레이 소자를 구현하였고 그 크기는 대각선 1인치에 달했다. 이 패시브 매트릭스 소자는 p-n 접합 소자에 비해 교차 혼선에 의한 역전류가 적어 정류비가 104 이상의 값을 나타내었다. 완성된 소자는 불산 처리를 통해 기판으로부터 쉽게 떼어낼 수 있으며, 각각 PDMS 와 유연한 PET 필름에 전이할 수 있었다.
Thin silicon ribbon was used for fabricating flexible silicon p-i-n junction devices, consisting of 100×100 arrays of pixels in 1 inch on the diagonal. Those passive matrix devices exhibited the rectification ratio >104 owing to smaller cross-talking current than that of p-n junction devices. P-i-n devices fabricated on silica/silicon substrates are easily detached by treatment with hydrofluoric acid and are subsequently transferred onto both PDMS and flexible PET film.

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