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Received March 7, 2011
Accepted March 29, 2011
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계면활성제 수용액에 의해 재생된 활성탄 촉매의 탈질 성능

DeNOx Performance of Activated Carbon Catalysts Regenerated by Surfactant Solution

공주대학교 화학공학부, 331-717 충남 천안시 서북구 부대동 275 1서울시립대학교 환경공학부, 130-743 서울 동대문구 전농동 90
Department of Chemical Engineering, Kongju National University, 275 Budae-dong, Seobuk-gu, Cheonan-si, Chungnam 331-717, Korea 1School of Environmental Engineering, Graduate School of Energy and Environmental System Engineering, University of Seoul, 90 Cheonnong-dong, Dongdaemun-ku, Seoul 130-743, Korea
jkjeon@kongju.ac.kr
Korean Chemical Engineering Research, December 2011, 49(6), 739-744(6), NONE Epub 25 November 2011
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Abstract

선택적환원 반응용 활성탄 촉매는 액정디스플레이 제조 공정에서 배출되는 붕소를 포함하는 배가스 중의 NOx를 제거하는데 사용되는데, 붕소가 촉매의 세공을 막거나 활성점에 침적되어 촉매 비활성화가 발생하게 된다. 폐촉매는 다양한 계면활성제를 포함하는 수용액 중에서의 세정, 건조 및 소성에 의해 재생이 가능하였다. 세정 과정의 조건, 계면활성제 종류, 소성 조건 등을 변화시키면서 재생 전과 후의 폐촉매의 물리화학적 성능 비교를 위하여 질소 흡착 실험, ICP에 의한 원소 분석을 수행하였다. 암모니아를 사용하는 선택적환원 반응은 고정층 촉매 반응기를 사용하여 120 ℃에서 수행하였다. 90 ℃의 수용액에서 비이온 계면활성제를 사용하여 세정하고, 질소 분위기에서 550 ℃에서 소성하여 재생한 활성탄 촉매는 붕소가 가장 많이 제거되어 신규 활성탄과 유사한 수준의 표면적과 NOx 제거 효율을 회복하였다.
Activated carbon SCR(CSCR) catalyst that is used to remove NOx in exhaust gas including boron discharged from the production process of liquid crystal display(LCD) shows deactivation when boron is deposited to block the pores within the catalyst or to cover its active sites. The spent carbon catalyst is regenerated by washing with various surfactants, drying and calcination. For comparison of the physical and chemical properties before and after the regeneration with the variables, type of surfactants and calcination condition, element analysis by ICP, N2 adsorption were conducted. DeNOx in SCR with NH3 was carried out in a fixed bed reactor at 120℃ . The activated carbon catalyst regenerated through washing with a non-ionic surfactant in H2O at 90 ℃ and calcination under N2 gas at 550 ℃ shows similar level of surface area and NOx removal efficiency with those of fresh catalyst.

References

Choi JC, Cho CH, Jeong KE, Jeon JK, Yim JH, Park YK, J. Korean Ind. Eng. Chem., 19(1), 92 (2008)
Seo PW, Kim SS, Hong SC, Korean J. Chem. Eng., 27(4), 1220 (2010)
Ouzzine M, Cifredo GA, Gatica JM, Harti S, Chafik T, Vidal H, Appl. Catal. A: Gen., 342(1-2), 150 (2008)
Galvez ME, Boyano A, Lazaro MJ, Moliner R, Chem. Eng. J., 144(1), 10 (2008)
Valdes-Solis T, Marban G, Fuertes AB, Appl. Catal. B: Environ., 46(2), 261 (2003)
Wang YL, Liu ZY, Zhan LA, Huang ZG, Liu QY, Ma JR, Chem. Eng. Sci., 59(22-23), 5283 (2004)
Stohr B, Boehm HP, Schlogl R, Carbon., 29(6), 707 (1991)
Carabineiro SA, Fernandes FB, Vital JS, Ramos AM, Silva IF, Catal. Today, 54(4), 559 (1999)
Yoon KS, Ryu SK, Korean J. Chem. Eng., 27(6), 1882 (2010)
Jo YB, Cha JS, Ko JH, Shin MC, Park SH, Jeon JK, Kim SS, Park YK, Korean J. Chem. Eng., “NH3 Selective Catalytic Reduction (SCR) of Nitrogen Oxides(NOx) over Activated Sewage Sludge Char,” Inpress (2010)
Lee SJ, Hong SC, J. Korean Ind. Eng. Chem., 19(3), 259 (2008)
Nojima S, Iida K, Obayashi Y, “Methods for the Regeneration of a Denitration Catalyst,” U.S. Patent No. 6,395,665 (2002)
Obayashi Y, Mitsuoka S, U.S. Patent No. 4,615,991 (1986)
Cha JS, Choi JC, Ko JH, Park YK, Park SH, Jeong KE, Kim SS, Jeon JK, Chem. Eng. J., 156(2), 321 (2010)

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