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Received May 30, 2018
Accepted June 22, 2018
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미세액적 유동반응기 공정에서 연속제조된 나노구조 SiO 2 :Zn 원환형 입자의 특성
Characteristics of Nano-structured SiO2:Zn Hollow Powders Prepared in the Micro Drop Fluidized Reactor (MDFR) Process
충남대학교 응용화학공학과, 34134 대전광역시 유성구 대학로 99 1에버 그린텍, 08639 서울특별시 금천구 시흥대로 97
Department Chemical Engineering and Applied Chemistry, Chungnam National University, 99, Daehak-ro, Yuseong-gu, Daejeon, 34134, Korea 1Ever Green Tech., 97, Siheung-daero, Geumcheon-gu, Seoul, 08639, Korea
Korean Chemical Engineering Research, August 2018, 56(4), 585-591(7), 10.9713/kcer.2018.56.4.585 Epub 3 August 2018
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Abstract
미세액적 유동반응기 공정에서 제조된 나노구조 SiO2:Zn 원환형 입자의 특성을 밴드갭 에너지와 표면 반응성의 관점에서 고찰하였다. SiO2:Zn 원환형 입자를 단일 공정에서 연속적이며 합리적인 생산 효율로 첨가제인 THAM(tris(hydroxymethyl)-aminomethane)과 도핑되는 Zn2+ 이온의 농도 변화에 따라 성공적으로 제조할 수 있었다. 그리고 Zn2+ 이온의 도핑은 Si4+ 이온의 conduction band 보다 에너지 레벨이 낮은 Zn2+ 이온의 acceptor level을 형성함으로써 SiO2:Zn 원환형 입자의 밴드갭 에너지를 줄일 수 있었다. 또한, 입자의 원환형 구조는 SiO2:Zn 입자의 밴드갭 에너지를 감소시키는데 기여하였다. 따라서 Zn2+ 이온이 도핑된 SiO2:Zn 원환형 입자는 표면에 SiO-H의 형성과 산소 결함의 생성으로 표면 반응성을 증대시킬 것으로 사료되었다.
Characteristics of nano-structured SiO2:Zn hollow powders prepared in the micro drop fluidized reactor process were investigated with respect to bandgap energy and surface activity. The SiO2:Zn hollow powders were successfully prepared continuously in the one step process with reasonable production efficiency, with varying the amount of THAM (tris(hydroxymethyl)-aminomethane) additive and concentration of Zn2+ ions. The doping of Zn2+ ions into SiO2 lattice led to the reduction of bandgap energy by forming the acceptor level of Zn2+ below the conduction band of Si4+ ions. The hollow shape also contributed to reduce the bandgap energy of SiO2:Zn powders. The doping of Zn2+ ions into SiO2 hollow powders could enhance the surface activity by forming SiO-H stretching and oxygen vacancies at the surface of SiO2:Zn powders.
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