교반 속도와 분산제 농도가 세리아(CeO2) 연마액의 현탁 정도 및 재분산에 미치는 영향을 조사하고, 최대 14일 방

치하여 세리아의 분산 안정성을 확인하였으며, 분산제 농도를 달리한 현탁액을 제조하여 나노입자 크기 및 분산 안정

성을 분석하였다. 분산제의 농도가 과도하게 첨가되면 세리아 나노입자가 2차 응집되고 부족하면 분산력이 감소한다

는 것이 밝혀졌다. 세 가지 분산제 중 가장 우수한 성능을 보인 분산제 PVP는 세륨 나노입자 분말을 82.1 nm로 분산

시킬 수 있었으며 분산 효과 및 분산 안정성이 가장 뛰어났다. 또한, 분산제를 첨가하지 않고 교반 속도에 변화를 주

어 관찰하였을 때 4000 rpm, pH 3에서 최적의 분산 효과를 얻을 수 있다.

The effects of stirring speed and dispersant concentration on the suspension and redispersion of ceria

(CeO2) polishing liquid was investigated. Sedimentation behavior of ceria was evaluated for up to 14 days, and

dispersion with varying dispersant concentrations were prepared to analyze the size and distribution of nanoparticles. It

was observed that an excessive concentration of dispersant led to secondary aggregation of ceria nanoparticles, while an

insufficient concentration resulted in decreased dispersing power. Among the three dispersants tested, PVP exhibited the

best performance, effectively dispersing cerium nanoparticle powder to an average size of 82.1 nm, thus providing

superior dispersion effect and stability. Furthermore, optimal dispersion was achieved at a stirring speed of 4000 rpm

and a pH of 3 in the absence of a dispersant.

CeO2, Chemical machine polishing, Polyvinyl pyrrolidone (PVP)

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