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In relation to this article, we declare that there is no conflict of interest.
Publication history
Received August 20, 2002
Accepted September 7, 2002
articles This is an Open-Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/bync/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
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Mp Criterion Based Multiloop PID Controllers Tuning for Desired Closed Loop Responses

Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, Korea 1School of Chemical Engineering and Technology, Yeungnam University, Kyongsan 712-749, Korea 2Department of Process Engineering, Samsung Engineering Company Ltd., 346-1 Glass Tower, Taechi-dong, Kangnam-gu, Seoul 135-708, Korea
swpark@mail.kaist.ac.kr
Korean Journal of Chemical Engineering, January 2003, 20(1), 8-13(6), 10.1007/BF02697177
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Abstract

A tuning method of multiloop PID controllers is developed based on the generalized IMC PID tuning rule by Lee et al. (1998a). To extend the SISO PID tuning method to MIMO systems, a new tuning criterion is proposed. The criterion is based on the closed loop frequency response method to meet desired performance and robustness as close as possible. Examples for 2×2, 3×3 and 4×4 systems are used to illustrate the proposed method. The results show that the proposed method is superior to conventional methods such as the BLT tuning method.

References

Basualdo MS, Marchetti JL, Chem. Eng. Commun., 97, 47 (1990)
Economou CG, Morari M, Ind. Eng. Chem. Process Des. Dev., 25, 411 (1986) 
Edgar TF, Heeb R, Hougen JO, Comput. Chem. Eng., 5, 225 (1981) 
Grosdidier P, Morari M, Comput. Chem. Eng., 22, 309 (1987)
Harris SL, Mellichamp DA, AIChE J., 31, 484 (1985) 
Ho WK, Hang CC, Cao LS, Automatica, 31, 197 (1995)
Hovd M, Skogestad S, Automatica, 30(10), 1601 (1994) 
Lee Y, Park S, Lee M, Brosilow C, AIChE J., 44(1), 106 (1998) 
Lee Y, Park S, Lee M, Ind. Eng. Chem. Res., 37(5), 1859 (1998) 
Luyben WL, Ind. Eng. Chem. Process Des. Dev., 25, 654 (1986) 
Seborg DE, Edgar TF, Mellichamp D, "Process Dynamics and Control, John Wiley, New York (1989)
Shiu SJ, Hwang SH, Ind. Eng. Chem. Res., 37(1), 107 (1998) 
Skogestad S, Morari M, Automatica, 25, 119 (1989) 
Zhu ZX, Jutan A, Chem. Eng. Sci., 51(12), 3325 (1996) 

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